Fujian Provincial Key Laboratory of Optoelectronic Technology and Devices, School of Opto-electronics and Communication Engineering, Xiamen University of Technology, Xiamen 361024, China
Fund Project:Project supported by the Young Scientists Fund of the National Natural Science Foundation of China (Grant Nos. 51702271, 61904155), the Natural Science Foundation of Fujian Province, China (Grant No. 2020J05239), and the Middle-Aged and Young Teachers Education , Scientific Research Program of the Education Department of Fujian Province, China (Grant No. JAT170407)
Received Date:15 April 2020
Accepted Date:14 July 2020
Available Online:09 November 2020
Published Online:20 November 2020
Abstract:CdZnTe recently emerged as a leading semiconductor crystal for fabricating room-temperature x- and gamma-ray imaging detectors, due to its excellent energy resolution and sensitivity. However, its wide deployment is hampered by the low availability of high-quality CdZnTe crystals. As-grown CdZnTe crystals generally encounter the problems arising from the impurities and defects, especially deep level defects. The presence of impurities and defects leads to severe charge trapping, which significantly affects detector performance. Especially for high counting rate imaging detector used in medical imaging and tomography, the accumulation of space charge at deep levels significantly deforms the electric field distribution and subsequently reduces the charge collection efficiency. Therefore, a considerable interest is focused on the investigation of the space charge accumulation effect in CdZnTe crystal, which is the key factor to improve the performance of high counting rate imaging detector. Thus, the goal of this work is to investigate the effects of deep level defects on space charge distribution and internal electric field in CdZnTe detector. In order to reveal the major problem therein, Silvaco TCAD technique is used to simulate the space charge and electric field distribution profile in CdZnTe detector with considering the typical deep level defects $ \rm Te_{Cd}^{++} $in CdZnTe crystals with activation energy of Ev + 0.86 eV and concentration of 1 × 1012 cm–3 at room temperature. The simulation results demonstrate that the Au/ CdZnTe /Au energy band tilts intensively with the increase of applied bias, which makes the deep level ionization fraction increase. The space charge concentration also increases in the crystal. Meanwhile, the dead layer of electric field distribution decreases, which is of benefit to the carrier collection of CdZnTe detector. In addition, under the premiseof the high resistivity of CdZnTe crystal, the reduction of deep level defect concentration located at Ev + 0.86 eV can narrow the internal dead layer moderately. The deep level defect located at Ev + 0.8 eV can also reduce the space charge concentration near the cathode, which flattens the electric field distribution with narrower dead layer, thus significantly improving the carrier collection efficiency of CdZnTe detector. These simulation results will provide meaningful theoretical guidance for further optimizing the CdZnTe crystal growth, device design and fabrication. Keywords:CdZnTe nuclear radiation detector/ space charge/ deep level defect/ charge collection efficiency
表3不同深能级缺陷浓度下CdZnTe晶体的电阻率仿真结果 Table3.The resistivity of CdZnTe crystals at different deep energy level concentrations via simulation.
23.2.深能级缺陷对空间电荷分布特性及器件性能的影响 -->
3.2.深能级缺陷对空间电荷分布特性及器件性能的影响
为了进一步研究深施主能级对CdZnTe晶体内部空间电荷以及内电场分布特性的影响规律, 本文选择深施主缺陷能级位置为Ev + 0.86 eV, 浓度为1 × 1012 cm–3条件下进行仿真, 其仿真结果如图2所示. CdZnTe晶体内部不同偏压下载流子浓度分布规律, 如图2(a)所示. 当外加偏压为0 V时, Au与CdZnTe界面处的载流子浓度低于体内的载流子浓度. 结合热平衡条件下Au/CdZnTe/Au的能带图(如图3(a)所示)可知, 当金属Au和n型CdZnTe晶体接触时, 因为金属Au的功函数大于半导体CdZnTe的功函数, 电子从半导体向金属流动, 金属的一侧聚集负电荷, 而半导体的一侧聚集正电荷. 积累的正电荷从半导体表面向内部延伸一定的厚度, 形成空间电荷区. 亦即Au与CdZnTe接触界面处存在一定的载流子耗尽区, 使得这部分电子的浓度低于CdZnTe晶体体内电子浓度. 与此同时, 空间电荷区的存在形成内建电场, 其电场的方向由半导体指向金属, 因而造成一定的能带弯曲. 随着外加偏压的增大, 晶体内载流子的浓度呈现出不均匀分布趋势. 这与外加偏压下Au/CdZnTe/Au能带倾斜有关. 如图3(b)所示, 当外加偏压大于0时, 由于外加电场的作用, Au/CdZnTe/Au能带发生由阴极向阳极逐渐倾斜的趋势, 从而使器件内载流子的浓度呈现不均匀分布. 图 2 不同偏压下的Au/CdZnTe/Au器件仿真结果 (a) 载流子浓度分布; (b) 深施主的电离浓度分布; (c) 空间电荷浓度分布; (d) 内部电场强度分布变化规律 Figure2. Simulation results of Au/CdZnTe/Au device under different bias voltages: (a) Distribution of carrier concentration; (b) density of ionized deep donors; (c) distribution of space charge concentration; (d) distribution of internal electric field intensity.
图 3 Au/CdZnTe/Au器件内能带和内部电场分布示意图 (a) 热平衡的Au/CdZnTe/Au能带结构图; (b) U > 0的Au/CdZnTe/Au能带结构图; (c) 内部电场分布示意图 Figure3. Energy-band diagram and internal electric field distribution in Au/CdZnTe/Au device: (a) Au/CdZnTe/Au energy-band diagram in thermal equilibrium; (b) Au/CdZnTe/Au energy-band diagram under U > 0; (c) schematic diagram of internal electric field distribution.