摘要/Abstract

官能团的保护/脱保护是有机合成中最基础的技能之一，理想保护基需具备容易引入、稳定及容易脱保护等条件，末端炔烃中的氢原子具有一定酸性，在某些反应中往往需要先进行保护.综述了末端炔烃保护基的研究进展，对极性较小的保护基如三甲基硅基（TMS）、三甲基锗基（Me₃Ge），极性较大的保护基如（3-氰基丙基）二甲基甲硅烷基（CPDMS）、（3-氰基丙基）二异丙基甲硅烷基（CPDIPS）和二苯基膦酰基（Ph₂P（O））进行了详细介绍
关键词: 保护基, 末端炔烃, Sonogashira偶联
The protection/deprotection of functional group is one of the fundamental technologies in organic synthesis. An ideal protecting group needs to satisfy the following issues:facile introduction, stability and facile deprotection. Protection of an acetylenic hydrogen is often necessary because of its acidity. In this review, the recent progress of protecting groups for terminal alkyne is highlighted. Based on different polarity of protecting groups, less polar protecting groups such as trimethylsilyl (TMS), trimethylgermanium group (Me₃Ge) and high polar protecting groups like (3-cyanopropyl)dimethylsilyl (CPDMS), (3-cyanopropyl)diisopropylsilyl (CPDIPS) and diphenylphosphoryl (Ph₂P(O)) are introduced in detail.
Key words: protecting group, terminal alkyne, Sonogashira coupling


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