刘阳^1,2,,
高生旺²,
王丽君²,
朱建超²,
高红¹,
夏训峰^2,
1.昆明理工大学建筑工程学院，昆明 650500
2.中国环境科学研究院，北京 100012
基金项目: 国家科技支撑计划课题2014BAL02B02国家科技支撑计划课题(2014BAL02B02)

Tetracycline degradation in aqueous solution by porous MoS2/g-C3N4

LIU Yang^1,2,,
GAO Shengwang²,
WANG Lijun²,
ZHU Jianchao²,
GAO Hong¹,
XIA Xunfeng^2,
1.Faculty of Civil Engineering and Architectural, Kunming University of Science and Technology, Kunming 650500, China
2.Chinese Research Academy of Environmental Sciences, Beijing 100012, China

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摘要:通过浸渍-高温煅烧法制备多孔MoS2/g-C3N4光催化剂，采用X射线衍射(XRD)、透射电子显微镜(TEM)、扫描电子显微镜(SEM)、N2吸附-解吸、紫外-可见光(UV-vis)漫反射吸收光谱对材料进行表征；并在可见光照射下，对四环素(TC)进行光催化降解。结果表明，催化剂量为2.0 g·L-1、pH为5.0时，对TC的去除效果最好，可见光照射180 min，MoS2/g-C3N4(1.0%-MC)复合材料对TC的降解率可达80.6%。反应完成后，复合材料循环利用5次，其降解效率仍保持在70.0%以上。浸渍-高温煅烧法所制备的MoS2/g-C3N4光催化剂具有良好的应用前景。
关键词: MoS2/g-C3N4/
浸渍-高温煅烧法/
四环素/
光催化降解

Abstract:The unique porous MoS2/g-C3N4 heterojunction photocatalyst was successfully constructed by a facile impregnation and calcination method. The obtained MoS2/g-C3N4 composites were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), N2 adsorption-desorption, and ultraviolet-visible (UV-vis) diffuse reflection spectroscopy. Then it was used to photocatalytic degrade tetracycline (TC) under visible light irradiation. The results showed that the optimum TC degradation effect was achieved at MoS2/g-C3N4(1.0%-MC) dosage of 2.0 g·L -1 and pH 5.0. After 180 min visible light irradiation, the removal rate of TC reached 80.6%. The used MoS2/g-C3N4 could be recycled for 5 times, and its degradation rate for TC maintained above 70.0%. The MoS2/g-C3N4 composites prepared by facile impregnation and calcination method have a good application prospect.
Key words:MoS2/g-C3N4/
impregnation and calcination method/
tetracycline (TC)/
photodegradation.

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刊出日期:2019-04-15

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多孔MoS2/g-C3N4材料对水环境中四环素的降解

刘阳^1,2,,
高生旺²,
王丽君²,
朱建超²,
高红¹,
夏训峰^2,
1.昆明理工大学建筑工程学院，昆明 650500
2.中国环境科学研究院，北京 100012
基金项目: 国家科技支撑计划课题2014BAL02B02国家科技支撑计划课题(2014BAL02B02)
关键词: MoS2/g-C3N4/
浸渍-高温煅烧法/
四环素/
光催化降解
摘要:通过浸渍-高温煅烧法制备多孔MoS2/g-C3N4光催化剂，采用X射线衍射(XRD)、透射电子显微镜(TEM)、扫描电子显微镜(SEM)、N2吸附-解吸、紫外-可见光(UV-vis)漫反射吸收光谱对材料进行表征；并在可见光照射下，对四环素(TC)进行光催化降解。结果表明，催化剂量为2.0 g·L-1、pH为5.0时，对TC的去除效果最好，可见光照射180 min，MoS2/g-C3N4(1.0%-MC)复合材料对TC的降解率可达80.6%。反应完成后，复合材料循环利用5次，其降解效率仍保持在70.0%以上。浸渍-高温煅烧法所制备的MoS2/g-C3N4光催化剂具有良好的应用前景。

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