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过渡金属催化卡宾对Si―H键的插入反应研究进展

本站小编 Free考研考试/2022-02-14

摘要/Abstract



有机硅化合物已被广泛应用于有机合成、生物医药和材料科学等领域.一直以来,发展简洁高效的C—Si键构筑方法学备受科学家们的广泛关注.过渡金属催化卡宾对Si—H键的插入反应是形成C—Si键的重要方法之一,不仅具有操作简便、反应条件温和及原子经济性高等优点,还可以通过手性配体的调控高对映选择性地实现手性有机硅烷化合物的合成.近年来,该领域取得了飞速的发展,涌现了许多新的卡宾前体和金属催化体系.按照过渡金属元素所处族的分类,分五个部分介绍了自2012年以来有关铁、铜、锌、钌、铑、钯、银、铱和金过渡金属卡宾对Si—H键插入反应的研究进展.
关键词: 过渡金属催化, 金属卡宾, Si—H键插入, C—Si键形成, 有机硅化合物
Organosilicon compounds have been widely used in organic synthesis, biomedicine, material science and other fields. The development of simple and efficient C——Si bond construction methodology has attracted extensive attention from scientists. Transition-metal-catalyzed carbene insertion reaction of Si——H bond is one of the important methods to form C——Si bond. It not only has the advantages of simple operation, mild reaction conditions and high atom economy, but also can be used to synthesize various chiral organosilanes with high enantioselectivity through the regulation of chiral ligands. In recent years, achieved rapid development has been in this field, and various new carbene precursors and metal catalytic systems have been emerged. According to the group of transition metal elements, recent advance in the iron, copper, zinc, ruthenium, rhodium, palladium, silver, iridium and gold catalyzed carbene insertion reactions of Si——H bond since 2012 is reviewed in five parts.
Key words: transition metal catalysis, metal carbene, Si—H bond insertion, C—Si bond formation, organosilane


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