外文题目: Laser-induced Damage of 355 nm High-reflective Mirror Caused by Nanoscale Defect
作者: Zhang Dongping; Zhu Maodong; Li Yan; Zhang Weili; Cai Xingmin; Ye Fan; Liang Guangxing; Zheng Zhuanghao; Fan Ping; Xia Zhilin
刊名: J. Wuhan Univ. Technol.-Mat. Sci. Edit.
年: 2017 卷: 32 期: 5 页： 1057--1060
英文关键词:
laser-induced damage; plasma treatment; defect
ELECTRON-BEAM EVAPORATION; THIN-FILMS; THRESHOLD; COATINGS; MICROSTRUCTURE
英文摘要:
Al2O3/SiO2 multilayer high-reflective (HR) mirrors at 355 nm were prepared by electron beam evaporation, and post-irradiated with Ar/O mixture plasma. The surface defect density, reflective spectra, and laser-induced damage characteristics were measured using optical microscopy, spectrophotometry, a damage testing system, and scanning electron microscopy (SEM), respectively. The results indicated that moderate-time of irradiation enhanced the laser-induced damage threshold (LIDT) of the mirror, but prolonged irradiation produced surface defects, resulting in LIDT degradation. LIDT of the mirrors initially increased and subsequently decreased with the plasma processing time. SEM damage morphologies of the mirrors revealed that nanoscale absorbing defects in sub-layers was one of the key factors limiting the improvement of LIDT in 355 nm HR mirror.


文献类型: 期刊论文
正文语种: English
收录类别: SCI
DOI: 10.1007/s11595-017-1710-y


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