外文题目: Pixel-based mask optimization via particle swarm optimization algorithm for inverse lithography
作者: Wang, Lei; Li, Sikun; Wang, Xiangzhao; Yang, Chaoxing; Tang, Feng
刊名: Proc.SPIE
来源图书: OPTICAL MICROLITHOGRAPHY XXIX
年: 2016 卷: 9780 文章编号：97801V
会议名称: Conference on Optical Microlithography XXIX
英文关键词:
Optical lithography; Resolution enhancement technique; Mask optimization; Particle swarm optimization
DESIGN; ROBUST
英文摘要:
An efficient pixel-based mask optimization method via particle swarm optimization (PSO) algorithm for inverse lithography is proposed. Because of the simplicity of principles, the ease of implementation and the efficiency of convergence, PSO has been widely used in many fields. In this study, PSO is used to solve the inverse problem of mask optimization. The pixel-based mask patterns are transformed into frequency space using discrete cosine transformation and the frequency components are encoded into particles. The pattern fidelity is adopted as the fitness function to evaluate these particles. The mask optimization method is implemented by updating the velocities and positions of these particles. Simulation results show that the image fidelity has been efficiently improved after using the proposed method.


文献类型: 会议论文
正文语种: English
收录类别: ISTP
DOI: 10.1117/12.2230404


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