外文题目: Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image
作者: Zhu, Boer; Wang, Xiangzhao; Li, Sikun; Yan, Guanyong; Shen, Lina; Duan, Lifeng
刊名: Appl. Optics
年: 2016 卷: 55 期: 12 页： 3192--3198
英文关键词:

PHASE-SHIFTING MASK; ILLUMINATION; PERFORMANCE; SYSTEMS; MARKS
英文摘要:
A wavefront aberration measurement method for a hyper-NA lithographic projection lens by use of an aerial image based on principal component analysis is proposed. Aerial images of the hyper-NA lithographic projection lens are expressed accurately by using polarized light and a vector imaging model, as well as by considering the polarization properties. As a result, the wavefront aberrations of the hyper-NA lithographic projection lens are measured accurately. The lithographic simulator PROLITH is used to validate the accuracies of the wavefront aberration measurement and analyze the impact of the polarization rotation of illumination on the accuracy of the wavefront aberration measurement, as well as the degree of polarized light and the sample interval of aerial images. The result shows that the proposed method can retrieve 33 terms of Zernike coefficients (Z(5) - Z(37)) with a maximum error of less than 0.00085 lambda. (C) 2016 Optical Society of America


文献类型: 期刊论文
正文语种: English
收录类别: SCIEI
DOI: 10.1364/AO.55.003192


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