外文题目: Nanoscale-resolved patterning on metal hydrazone complex thin films using diode-based maskless laser writing in the visible light regime
作者: Zhang, Kui; Chen, Zhimin; Geng, Yongyou; Wang, Yang; Wu, Yiqun
刊名: Chin. Opt. Lett.
年: 2016 卷: 14 期: 5 文章编号：51401
英文关键词:

THERMAL LITHOGRAPHY; ETCHING CHARACTERISTICS; PHOTOLITHOGRAPHY; FABRICATION; DIMENSIONS; RESOLUTION; BEAM
英文摘要:
Metal hydrazone complex thin films are used as laser patterning materials, and the patterns with a minimum resolution of about 78 nm are successfully obtained by the laser writing setup (lambda = 405 nm, NA = 0.9). The minimum resolution is only about 1/8 of the writing spot size. In the formation of patterns, there is only a single step for forming patterns by the laser heating-induced clear thermal gasification threshold effect without any other development processes such as wet etching. This work provides an effective method for directly achieving nanoscale-resolved pattern structures with diode-based maskless laser writing lithography at visible light wavelengths.


文献类型: 期刊论文
正文语种: English
收录类别: SCIEI
DOI: 10.3788/COL201614.051401


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