外文题目: Effects of annealing time on the structure, morphology, and stress of gold-chromium bilayer film
作者: 张洪; 晋云霞; 王虎; 孔钒宇; 黄昊鹏; 崔云
刊名: Chin. Phys. B
年: 2016 卷: 25 期: 10 文章编号：104205
英文关键词:
gold-chromium film; film stress; diffusion
PULSE-COMPRESSION GRATINGS; DAMAGE-THRESHOLD; THIN-FILMS; MULTILAYER; TEMPERATURE; PERFORMANCE; LAYERS; XPS; MECHANISM
英文摘要:
In this work, a 200-nm-thick gold film with a 10-nm-thick chromium layer used as an adhesive layer is fabricated on fused silica by the electron beam evaporation method. The effects of annealing time at 300 degrees C on the structure, morphology and stress of the film are studied. We find that chromium could diffuse to the surface of the film by formatting a solid solution with gold during annealing. Meanwhile, chromium is oxidized on the surface and diffused downward along the grain grooves in the gold film. The various operant mechanisms that change the residual stresses of gold films for different annealing times are discussed.


文献类型: 期刊论文
正文语种: English
收录类别: SCIEI
DOI: 10.1088/1674-1056/25/10/104205


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