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Stress-state manipulation in fused silica via femtosecond laser irradiation_上海光学精密机械研究所

上海光学精密机械研究所 免费考研网/2018-05-06

外文题目: Stress-state manipulation in fused silica via femtosecond laser irradiation
作者: Bellouard, Yves; Champion, Audrey; McMillen, Benjamin; Mukherjee, Sebabrata; Thomson, Robert R.; Pepin, Charles; Gillet, Philippe; Cheng, Ya
刊名: Optica
年: 2016 卷: 3 期: 12 页: 1285--1293
英文关键词:

OPTICAL-WAVE-GUIDES; ON-A-CHIP; TRANSPARENT MATERIALS; PHOTOSENSITIVE GLASS; PULSES; FABRICATION; WRITTEN; NANOGRATINGS; EXPOSURE; ENERGY
英文摘要:
Controlling the stress in glass after laser exposure is of prime importance not only for photonics applications, but also for preserving the mechanical integrity of glass components in general. The sub-surface exposure of fused silica to femtosecond laser pulses can induce a permanent and localized modification to the glass structure. In this work, we present evidence that femtosecond laser exposure can be used to continuously tailor the stress in the material, from a tensile to compressive state, as the laser pulse energy is changed. In addition, we demonstrate that this effect can not only be obtained while transitioning between different laser-induced microstructures, but also at low pulse energy, in the laser exposure regime particularly relevant for fabricating waveguides. These results demonstrate that femtosecond laser exposure is a versatile tool for fully controlling the stress landscape in a volume of silica, opening up new technological opportunities, like for instance, direct write stress-free waveguides, direct-write stress-induced birefringence state or mechanically reinforced parts, by locally preloading it. Published by The Optical Society under the terms of the Creative Commons Attribution 4.0 License.


文献类型: 期刊论文
正文语种: English
收录类别: SCI
DOI: 10.1364/OPTICA.3.001285


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