外文题目: Multilayer deformation planarization by substrate pit suturing
作者: Chai, Yingjie; Zhu, Meiping; Xing, Huanbin; Wang, Hu; Cui, Yun; Shao, Jianda
刊名: Opt. Lett.
年: 2016 卷: 41 期: 15 页： 3403--3406
英文关键词:

LASER-INDUCED DAMAGE; HIGH-REFLECTIVE COATINGS; NODULAR DEFECTS; NM; INTENSIFICATION; RESISTANCE; IGNITION; MIRRORS; SIZE
英文摘要:
In the pursuit of 1064 nm high-power laser resistance dielectric coatings in the nanosecond region, a group of HfO2/SiO2 high reflectors with and without suture layers were prepared on prearranged fused silica substrates with femtosecond laser pits. Surface morphology, global coating stress, and high-resolution cross sections were characterized to determine the effects of substrate pit suturing. Laser-induced damage resistance was investigated for samples with and without suture layers. Our results indicate considerable stability in terms of the nanosecond 1064 nm laser-induced damage threshold for samples having a suture layer, due to decreased electronic field (e-field) deformation with simultaneous elimination of internal cracks. In addition, a suture layer formed by plasma ion-assisted deposition could effectively improve global mechanical stress of the coatings. By effectively reducing the multilayer deformation using a suture layer, electron-beam high-reflective coatings, whose laser-induced damage resistance was not influenced by the substrate pit, can be prepared. (C) 2016 Optical Society of America


文献类型: 期刊论文
正文语种: English
收录类别: SCIEI
DOI: 10.1364/OL.41.003403


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