基本信息

姓 名： 葛佳
性 别： 男
出生年月： 1985.12
职 称： 教授 硕导
E-mail： ge.jia@njtech.edu.cn
工作地点：

学缘情况和工作经历

2018至今 南京工业大学，材料科学与工程学院，教授
2014-2018 新加坡太阳能研究所，研究员，项目负责人，博士生科研顾问
2010-2014 新加坡国立大学，新加坡太阳能研究所，博士（电子工程、光伏）论文：晶硅异质结光伏电池的表面钝化
2006-2010 新加坡国立大学，电子工程学学士（一等荣誉学位）论文：次世代隧道场效应晶体管
主要研究方向

· 晶硅异质结光伏电池
· 晶硅异质结光伏电池的表面钝化与优化
· 晶硅异质结光伏电池的研发，表征与优化
· 应用于光伏电池的等离子体增强化学气相沉积技术及工艺分析
· 非（微）晶硅及其衍生材料的合成，表征与优化
· 应用氢气等离子体去除硅片表面的氧化层及后续钝化处理
· 透光导电氧化物的物理气相沉积及材料
高水平代表性论文

SCI期刊
[1] J. Ge, M. Prinz, T. Markert, A.G. Aberle and T. Mueller, "Ambient Plasma Treatment of Silicon Wafers for Surface Passivation Recovery", Jpn. J. Appl. Phys., accepted (2017).
[2] M. Tang, J. Ge, J. Wong, Z. Liu, T. Dippell, Z. Zhang, M. Huber, M. Doerr, O. Hohn, P. Wohlfart, A.G. Aberle and T. Mueller, "Investigation of Low-Temperature Hydrogen Plasma-Etching Processes for Silicon Wafer Solar Cell Surface Passivation in an Industrial Inductively Coupled Plasma Deposition Tool", IEEE J. Photovolt., vol. 6, pp. 10-16 (2016).
[3] M. Tang, J. Ge, J. Wong, Z.P. Ling, T. Dippell, Z. Zhang, M. Huber, M. Doerr, O. Hohn, P. Wohlfart, A.G. Aberle and T. Mueller, "Excellent passivation of thin silicon wafers by HF-free hydrogen plasma etching using an industrial ICPECVD tool", physica status solidi (RRL) - Rapid Research Letters, vol. 9, pp. 47-52 (2015).
[4] J. Ge, M. Tang, J. Wong, R. Stangl, Z. Zhang, T. Dippell, M. Doerr, O. Hohn, M. Huber, P. Wohlfart, A.G. Aberle and T. Mueller, "Investigation of Wide Process Temperature Window for Amorphous Silicon Suboxide Thin-Film Passivation Deposited by Inductively Coupled PECVD", IEEE J. Photovolt., vol. 5, pp. 705-710 (2015).
[5] J. Ge, M. Tang, J. Wong, Z. Zhang, T. Dippell, M. Doerr, O. Hohn, M. Huber, P. Wohlfart, A.G. Aberle and T. Mueller, "Excellent Silicon Surface Passivation Achieved by Industrial Inductively Coupled Plasma Deposited Hydrogenated Intrinsic Amorphous Silicon Suboxide", Int. J. Photoenergy, vol. 2014, pp. 1-12 (2014).
[6] J. Ge, Z.P. Ling, J. Wong, R. Stangl, A.G. Aberle and T. Mueller, "Analysis of intrinsic hydrogenated amorphous silicon passivation layer growth for use in heterojunction silicon wafer solar cells by optical emission spectroscopy", J. Appl. Phys., vol. 113, pp. 234310-7 (2013).
EI期刊
[1] J. Ge, Z.P. Ling, J. Wong, T. Mueller and A.G. Aberle, "Optimisation of Intrinsic a-Si:H Passivation Layers in Crystalline-amorphous Silicon Heterojunction Solar Cells", Energy Procedia, vol. 15, pp. 107-117 (2012).
[2] Z.P. Ling, J. Ge, J. Wong, T. Mueller and A.G. Aberle, "Optimisation of p-doped μc-Si:H Emitter Layers in Crystalline-amorphous Silicon Heterojunction Solar Cells", Energy Procedia, vol. 15, pp. 118-128 (2012).
其他期刊
[1] Z.P. Ling, J. Ge, R. Stangl, A.G. Aberle and T. Mueller, "Micro Raman Spectroscopy Analysis of Doped Amorphous and Microcrystalline Silicon Thin Film Layers and its Application in Heterojunction Silicon Wafer Solar Cells", Trans. Mater. Res. Soc. Jpn (2014).
[2] Z.P. Ling, J. Ge, R. Stangl, A.G. Aberle and T. Mueller, "Detailed Micro Raman Spectroscopy Analysis of Doped Silicon Thin Film Layers and Its Feasibility for Heterojunction Silicon Wafer Solar Cells", Journal of Materials Science and Chemical Engineering, vol. 1, pp. 1-14 (2013).
授权发明专利

· 新加坡专利（W）：A Method to Enhance Mechanical and Electrical Properties of Plated Metal Electrodes on Surfaces Using Atmospheric Pressure Plasma Treatment
· 新加坡专利（P）：A Method for Thin Film Deposition Used in Photovoltaic Devices By Atmospheric Pressure Plasma Coating
研究成果

· 业内先进的超薄电感耦合PECVD非晶氧化硅钝化层工艺
· 业内先进的氢气等离子体去除硅片表面氧化层及后续钝化工艺
· 独创性应用大气压等离子体提升非晶氧化硅对单晶硅片的钝化效果
· 应用大气压等离子体提高表面钝化效果以及金属与TCO之间的粘附力
· 应用大气压等离子体的钝化及TCO材料镀层