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清华大学机械工程系导师教师师资介绍简介-何永勇

本站小编 Free考研考试/2020-04-15

何永勇
研究员,博士生导师
摩擦学国家重点实验室
联系电话:
通信地址:清华大学李兆基大楼A622,100084
电子邮箱:heyy@mail.tsinghua.edu.cn





教育背景
工作履历
教学工作
科研工作
论文与专利
奖励与荣誉
学术兼职
学术成果

1994.4 — 1997.4:东南大学精密仪器系,机械故障诊断与振动控制专业,博士
1991.9 — 1994.4:东南大学机械工程系,测控技术与故障诊断专业,硕士
1987.9 — 1991.7:南京航空学院机械工程系,机电一体化专业,本科


2018.12 — 现 在 清华大学,机械工程系,研究员
2001.08 — 2018.11 清华大学,精密仪器与机械学系/机械工程系,副研究员
1999.12 — 2001.07 清华大学,精密仪器与机械学系,讲师
1997.04 — 1999.11上海交通大学,机械工程系,讲师
2007.12 — 2008.11 英国Bristol大学,访问
2003.08 — 2004.02 香港城市大学,制造工程与工程管理系,Croucher Foundation访问
2002.06 — 2002.12 香港城市大学,制造工程与工程管理系,访问


本科生课程:
《机械设计基础A(2)》、《机械设计综合实践C》


表界面改性与性能增强理论与方法研究
针对液压泵、齿轮箱和推理轴承等典型摩擦副,研究金属基和石墨烯、二硫化钼等二维碳基材料作为固体纳米润滑添加剂的润滑机理及添加剂制备工艺,提升摩擦副表界面润滑性能和耐磨性能;研究表面织构流场特性与润滑机理、以及面向摩擦副改性的表面织构优化设计策略与方法,提升摩擦副表面润滑性能;研究基于空心阴极离子源扩渗的渗氮、氮碳共渗和氮碳硫多元共渗方法与技术,提升摩擦副表面摩擦磨损性能。

化学机械抛光及超光滑表面制造研究
化学机械抛光(CMP)是目前唯一能获得全局平面化效果的超精密加工和纳米制造技术。研究化学机械抛光原理与工艺,并将CMP技术延伸到铁基材料超精密加工领域,发展铁基材料超光滑表面制造技术。

表界面损伤机理及检测技术研究
声发射(Acoustic Emission,AE)是指材料发生变形或断裂损伤时释放应变能产生应力波的现象。针对摩擦磨损过程表界面损伤,采用声发射技术研究典型脆性材料和塑性材料的表面损伤宏观机制与微观机理以及相应的声发射特征,发展基于声发射技术的表界面损伤检测方法和摩擦磨损状态检测方法。


代表性学术论文
1 Zhao J, Mao JY, Li YR, He YY, Luo JB. Friction-induced Nano-structural Evolution of Graphene as a Lubrication Additive. Applied Surface Science, 2018, 434: 21-27.
2 Li Y, He YY, Wang W, WJY, Zhang L, Zhu YJ, Ye QW, Plasma Nitriding of AISI 304 Stainless Steel in Cathodic and Floating Electric Potential: Influence on Morphology, Chemical Characteristics and Tribological Behavior, Journal of Materials Engineering and Performance, 2018, 27(3): 948-960.
3 Mao JY, Zhao J, Wang W, He YY, Luo J B. Influence of the Micromorphology of Reduced Graphene Oxide Sheets on Lubrication Properties as a Lubrication Additive. Tribology International, 2018, 119: 614-621.
4 Zhao J, Gao M, Ma MX, Cao XF, He YY, Wang WH, Luo JB. Influence of annealing on the tribological properties of Zr-based bulk metallic glass. Journal of Non-Crystalline Solids, 2018, 481: 94-97.
5 Wang W, He YY, Li Y, Wei B, Hu YT, Luo JB. Investigation on Inner Flow Field Characteristics of Groove Textures in Fully Lubricated Thrust Bearings. Industrial Lubrication and Tribology, 2018, 70(4): 754-763.
6 Li Y, He YY, Zhang SZ, Wang W, Zhu, YJ, Microstructure and Corrosion Resistance of Nitrogen-rich Surface Layers on AISI 304 Stainless Steel by Rapid Nitriding in a Hollow Cathode Discharge, Applied Physics A-Materials Science & Processing, 2018, 12(1):65.
7Li Y, He YY, Zhang SZ, He XC, Wang W, Hu BG, Microstructures and Tribological Behaviour of Oxynitrided Austenitic Stainless Steel, Vacuum, 2017: 146:1-7.
8 Zhao J, Li YR, Mao J, He YY, Luo J B. Synthesis of Thermally Reduced Graphite Oxide in Sulfuric Acid and Its Application as an Efficient Lubrication Additive. Tribology International, 2017, 116: 303-309.
9 Li Y, He YY, Xiu, JJ, Wang W, Zhu, YJ, Hu BG, Wear and corrosion properties of AISI 420 martensitic stainless steel treated by active screen plasma nitriding, Surface & Coatings Technology, 2017, 329: 184-192.
10Wang W, He YY, Zhao J, Li Y, Luo JB. Numerical Optimization of the Groove Texture Bottom Profile for Thrust Bearings, Tribology International, 2017, 109: 69-77.
11 Zhao J, Li YR, Wang YF, Mao JY, He YY, Luo JB. Mild thermal reduction of graphene oxide as a lubrication additive for friction and wear reduction, RSC Advances, 2017, 7(3): 1766-1770.
12Zhao DW, He YY, Wang TQ, Lu XC. Comparative Study of the Lubricating Behavior Between 12-in. Copper Disk and Wafer During Chemical Mechanical Polishing, Tribology International, 2017, 105: 37-41.
13Li YR, Zhao J, Tang C, He YY, Wang YF, Chen J, Mao JY, Zhou QQ , Wang BY, Wei F, Luo JB. Highly Exfoliated Reduced Graphite Oxide Powders as Efficient Lubricant Oil Additives, Advanced Materials Interfaces, 2016, 3(22): **.
14 Zhou WB, He YY, Lu XC. Scratch deformation mechanism of copper based on acoustic emission, Insight, 2016, 256-263.
15Zhao J, He YY, Wang YF, Wang W, Yan L, Luo JB. An investigation on the tribological properties of multilayer graphene and MoS2 nanosheets as additives used in hydraulic applications, Tribology International, 2015, 97: 14-20.
16Jiang L, He YY, Li J, Luo JB. Passivation Kinetics of 1,2,4-Triazole in Copper Chemical Mechanical Polishing, ECS Journal of Solid State Science and Technology, 2016, 5(5): 272-279.
17Jiang L, He YY, Liang H, Li YZ, Luo JB. Effect of Potassium Ions on Tantalum Chemical Mechanical Polishing in H2O2-Based Alkaline Slurries, ECS Journal of Solid State Science and Technology, 2016, 5(2): 100-111.
18Jiang L, Yao WF, He YY, Cheng ZD, Yuan JL, Luo JB. An Experimental Investigation of Double-side Processing of Cylindrical Rollers Using Chemical Mechanical Polishing Technique, International Journal of Advanced Manufacturing Technology, 2016, 82(1-4): 523-534.
19 Zhou WB, He YY, Lu XC. Acoustic emission in scratch processes of metals, Insight, 2015, 57(11) : 635-642.
20Cheng J, Wang TQ, He YY, Lu XC. Material Removal Mechanism of Copper Chemical Mechanical Polishing in a Periodate-based Slurry, Applied Surface Science, 2015, 337: 130-137.
21 Jiang L, He YY, Luo JB. Chemical mechanical polishing of steel substrate using colloidal silica-based slurries, Applied Surface Science, 2015, 330: 487-495.
22 Jiang L, He YY, Yang Y, Luo JB. Chemical mechanical polishing of stainless steel as solar cell substrate, ECS Journal of Solid State Science and Technology, 2015, 4(5): 162-170.
23 Li Y, Zhang SZ, He YY, Zhang L, Wang L. Characteristics of the Nitrided Layer Formed on AISI 304 Austenitic Stainless Steel by High Temperature Nitriding Assisted Hollow Cathode Discharge, Materials & Design, 2014, 64: 527-534.
24 Jiang L, He YY, Luo JB. Effects of pH and Oxidizer on Chemical Mechanical Polishing of AISI 1045 Steel, Tribology Letters, 2014, 56(2): 327-335.
25 Jiang L, He YY, Li YZ, Luo JB. Effect of ionic strength on ruthenium CMP in H2O2-based slurries, Applied Surface Science, 2014, 317: 332-337.
26 Jiang L, He YY, Li Y, Li YZ, Luo JB. Synergetic effect of H2O2 and glycine on cobalt CMP in weakly alkaline slurry, Microelectronic Engineering, 2014, 122: 82-86.
27 Jiang L, He YY, Niu XY, Li YZ, Luo JB. Synergetic effect of benzotriazole and non-ionic surfactant on copper chemical mechanical polishing in KIO4-based slurries, Thin Solid Films, 2014, 558: 272-278.
28 Jiang L, Lan YQ, He YY, Li Y, Li YZ, Luo JB. 1,2,4-Triazole as a corrosion inhibitor in copper chemical mechanical polishing, Thin Solid Films, 2014, 556: 395-404.
29 Jiang L, Lan YQ, He YY, Li YZ, Luo JB. Functions of Trilon? P as a polyamine in copper chemical mechanical polishing, Applied Surface Science, 2014, 288: 265-274.
30 He YY, Zhao ZK,Luo TY, Lu XC, Luo JB. Failure Analysis of Journal Bearing Used in Turboset of A Power Plant, Materials & Design,2013, 52: 923-931.
31Zhao DW, Wang TQ, He YY, Lu XC, Kinematic Optimization for Chemical Mechanical Polishing Based On Statistical Analysis of Particle Trajectories, IEEE Transactions On Semiconductor Manufacturing, 2013, 26(4): 556-563.
32 Zhao DW, He YY, Wang TQ, Lu XC, Luo JB. Wafer Bending/orientation Characterization and Their Effects on Fluid Lubrication During Chemical Mechanical Polishing, Tribology International, 2013, 66: 330-336.
33Wang TQ, Lu XC, Zhao DW, He YY. Contact Stress Non-uniformity of Wafer Surface for Multi-zone Chemical Mechanical Polishing Process, Science China-Technological Sciences,2013, 56(8): 1974-1979.
34Wang TQ, Zhao DW, He YY, Lu XC. Effect of Slurry Injection Position on Material Removal in Chemical Mechanical Planarization, International Journal of Advanced Manufacturing Technology, 2013, 67(9-12): 2903-2908.
35 Zhao DW, Wang TQ, He YY, Lu XC. Effect of Zone Pressure on Wafer Bending and Fluid Lubrication Behavior During Multi-zone CMP Process, Microelectronic Engineering, 2013, 108: 33-38.
36Zhao ZK, He YY, Yang HF, Qu XP, Lu XC, Luo JB. Aminosilanization Nanoadhesive Layer for Nanoelectric Circuits with Porous Ultralow Dielectric Film, ACS Applied Materials & Interfaces,2013, 5(13): 6097-610.
37 He YY, Zhang XM. Approximate Entropy Analysis of the Acoustic Emission from Defects in Rolling Element Bearings, ASME Transaction- Journal of Vibration and Acoustics, 2012, 134( 6): 061012.
38 Zhao DW, He YY, Wang TQ, Lu XC. Effect of Kinematic Parameters and Their Coupling Relationships on Global Uniformity of Chemical-Mechanical Polishing, IEEE Transactions On Semiconductor Manufacturing, 2012, 25(3): 502-510.
39 He YY, Huang J, Zhang B. Approximate Entropy as A Nonlinear Feature Parameter for Fault Diagnosis in Rotating Machinery, Measurement Science & Technology, 2012, 23(4): 045603.
40 Zhao DW, He YY, Wang TQ, Lu XC, Luo JB. Effects of the Polishing Variables on the Wafer-Pad Interfacial Fluid Pressure in Chemical Mechanical Polishing of 12-Inch Wafer, Journal of the Electrochemical Society, 2012, 159(3): H342-H348.
41 Zhao DW, He YY, Lu XC. In Situ Measurement of Fluid Pressure at the Wafer-Pad Interface during Chemical Mechanical Polishing of 12-inch Wafer, Journal of the Electrochemical Society, 2012, 159(1): H22-H28.
42 He YY, Liu Y. Experimental Research into Time–frequency Characteristics of Cavitation Noise Using Wavelet Scalogram, Applied Acoustics, 2011, 72: 721–731.
43 He YY, Wu Y. Combining Whitening Filter and Wavelet Transform to De-noise Cavitation Noise for Cavitation State Monitoring, Insight, 2011, 53(4): 1-7.
44 Li J, Lu XC, He YY, Luo JB. Modeling the Chemical-Mechanical Synergy during Copper CMP. Journal of the Electrochemical Society, 2011, 158(2): H197-H202.
45He YY, Zhang XM, Friswell MI. Observation of Time-frequency Characteristics of the Acoustic Emission from Defects in Rolling Element Bearings, Insight,2010, 52(8): 412-418.
46 He YY, Zhang XM and Michael I. Friswell. Defect Diagnosis for Rolling Element Bearings Using Acoustic Emission, Journal of Vibration and Acoustic, Transaction of the ASME, 2009, 131(6): 061012.
代表性授权专利
1. 航空轴向柱塞液压泵(第一发明人),ZL6.1
2. 用于加工超光滑轴承钢表面的抛光液及其应用(第三发明人),ZL4.4
3. 用于钴阻挡层结构化学机械抛光的抛光液及其应用(第三发明人),ZL4.9
4. 轴承圆柱滚子圆柱面的超精加工方法(第五发明人),ZL2.1
5. 化学机械抛光机及具有它的化学机械抛光设备(第三发明人),ZL8.1
6. 抛光头(第三发明人),ZL7.0
7. 一种抛光垫修整头(第三发明人),ZL3.6
8. 一种用于化学机械抛光设备的晶圆交换装置(第四发明人),ZL6.8
9. 一种新型化学机械抛光装置(第三发明人),ZL4.3
10. 一种硅片边缘膜厚测量方法(第三发明人),ZL6.3
11. 抛光液物理参数测量装置、测量方法和化学机械抛光设备(第三发明人),ZL6.2
12. 化学机械抛光设备(第二发明人),ZL4.X


1. “高精度轴承超精密加工关键技术及产业化应用”,浙江省科学技术进步一等奖,2016年(第6完成人),
2. “机械设备健康维护的若干理论与方法”,教育部高等学校自然科学一等奖,2011年(第5完成人)
3. “水电机组状态监测与故障诊断技术研究及应用”,教育部高等学校科技进步二等奖,2006年(第2完成人)
4. “300MW汽轮发电机组振动监测及分析诊断系统开发研究”,广东省科技进步二等奖,2003年(第3完成人)
5. 2005年入选教育部“新世纪优秀人才支持计划”
6. 2003年获香港Croucher基金会访问研究基金奖励


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学术成果初始内容
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