中文题目: 改性抛光剂对光学玻璃抛光质量的影响
外文题目: Effect of Modified Polishing Agent on Polishing Quality of Optical Glass
作者: 梁尚娟; 汤文龙; 焦翔; 朱健强
刊名: 中国激光
年: 2017 卷: 44 期: 12 文章编号：1203001
中文关键词:
材料; 表面活性剂; 化学机械抛光; 光学玻璃; 材料去除率; 表面粗糙度
英文关键词:

materials; surfactant; chemico-mechanical polishing; optical glass; material removal rate; surface roughness
中文摘要:
为了抑制抛光粉纳米颗粒的团聚,改善抛光液的性能,使光学玻璃获得更高的抛光速率与更低的表面粗糙度,在氧化铈抛光液中添加阴离子表面活性剂梅迪兰,研究了梅迪兰质量分数对抛光液中粒子粒径、分散性以及材料去除率和抛光后光学玻璃表面粗糙度的影响。结果表明:微量梅迪兰能显著改善抛光液中粒子的分散性,抑制纳米粒子的团聚,提高抛光液的质量;当梅迪兰质量分数为0~0.32%时,随着质量分数增大,化学机械抛光速率先增大后减小,当质量分数为0.26%时达到最大值122nm/min;玻璃的表面粗糙度随着梅迪兰质量分数增加而先减小后增大,在质量分数为0.13%时达到最小值0.928nm。

英文摘要:
To restrain agglomeration of nanoparticles in polishing powders and improve properties of polishing slurry,so as to achieve better polishing properties of optical glass such as polishing rate,surface roughness and so on,we add a kind of anionic surfactant Medialan into ceria polishing slurry and study the effects of Medialan mass fraction on size and dispersion of particles,and material removal rate,as well as surface roughness of polished optical glass.The results show that the addition of trace Medialan can significantly improve dispersion of particles in the polishing slurry,restrain agglomeration of ceria particles,and improve quality of the polishing slurry.When the mass fraction of Medialan is between 0and 0.32%,the chemico-mechanical polishing rate increases firstly and then decreases with the increase of Medialan mass fraction.When the mass fraction of Medialan is 0.26%,the chemicomechanical polishing rate reaches the maximum value of 122nm/min.The surface roughness firstly decreases and then increases with the increase of Medialan mass fraction,and the surface roughness reaches the minimum value of 0.928nm when the mass fraction of Medialan is 0.13%.


文献类型: 期刊论文
正文语种: Chinese
收录类别: CSCD
DOI: 10.3788/CJL201744.1203001


全文传递服务