中文题目: 超高NA光刻投影物镜高阶波像差检测方法
外文题目: High-Order Aberration Measurement Method for Hyper-NA Lithographic Projection Lens
作者: 诸波尔; 王向朝; 李思坤; 孟泽江; 张恒; 戴凤钊; 段立峰
刊名: 光学学报
年: 2017 卷: 37 期: 4 文章编号：412003
中文关键词:
测量; 光刻; 高阶波像差; 空间像; 主成分分析
英文关键词:

measurement; lithography; high-order aberration; aerial image; principal component analysis
中文摘要:
提出了一种基于八角度孤立空检测标记的超高NA光刻投影物镜高阶波像差检测方法。通过对八角度孤立空检测标记的空间像进行主成分分析(PCA)和多元线性回归分析,构建了超高NA光刻投影物镜的空间像光强分布与高阶波像差之间的线性模型,并基于该模型实现了高阶波像差的检测。与使用六角度孤立空检测标记的传统方法相比,本方法提高了光瞳面波前的采样效率,拓展了波像差检测范围,实现了超高NA光刻投影物镜高阶波像差(Z_5~Z_(64))的高精度检测。光刻仿真软件PROLITH的仿真结果表明,该方法可实现60项泽尼克系数(Z_5~ Z_(64))的检测,检测精度优于1.03*10~(-3)lambda。

英文摘要:
A high-order aberration measurement method for hyper-NA lithographic projection lens based on a test target with eight angles is proposed.A linear model between aerial image intensity distribution of the hyper-NA lithographic projection lens and high-order aberrations is built by principal component analysis (PCA)and multivariate linear regression analysis for binary target with eight angles of aerial image.And the high-order aberration measurement is achieved based on the proposed model.Compared with the binary target with six angles in the conventional method,the proposed method improves the efficiency of pupil wavefront sampling,expands the measuring range of the wavefront aberrations,and achieves the high precision measurement of high-order aberrations(Z_5~Z_(64))of the hyper-NA lithographic projection lens.Simulations with the lithographic simulator PROLITH show that the proposed method can realize the measurement for 60 terms of Zernike coefficients(Z_5~ Z_(64))with measurement accuracy better than 1.03*10~(-3)lambda.


文献类型: 期刊论文
正文语种: Chinese
收录类别: CSCD
DOI: 10.3788/AOS201737.0412003


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