单 位
职 称
学 历
研究方向
武汉大学物理科学与技术学院加速器实验室教授
武大弘毅新材料有限公司总工程师
电话/传真:027-6875-3587
Email:djfu@whu.edu.cn
Home:www.acc-lab.whu.edu.cn
一、简历
1981-1985，武汉大学物理系,获理学学士学位
1985-1988，武汉大学物理系，获理学硕士学位
1988-1996，三峡大学数理系，助教、讲师
1996-1999，武汉大学物理系，获理学博士学位
1999-2002，（韩国）东国大学量子功能半导体研究中心，博士后fellow
从事GaN、MOS、纳米pyramid、磁性半导体的研究工作
2001-2004，（韩国）东国大学量子功能半导体中心，研究教授
2004年－今，武汉大学物理学院加速器实验室，教授
从事离子束分析、原位探测技术、离子束材料合成与改性、宽禁带半导体、自旋电子学研究
二、科学研究与对外服务
1.教育部留学归国人员启动基金：离子注入制备GaN、ZnO基磁性半导体
2.国家自然科学基金重点项目：加速器-电镜联机及其在材料科学中的应用
3.科技部中韩国际科技合作项目：在线离子束制备铁电铁磁性纳米结构器件及其原位离子束表征。以上项目主要成果如下：
-国内第一套加速器-电镜联机装置
-计算机扫描RBS/C系统
-低能团簇负离子注入/沉积靶室，可用于graphene制备和超浅结研究
4.国家发改委高新技术产业化示范工程：氮化碳超硬涂层技术产业化
5.工信部国家科技重大专项：用于黑色金属加工的超细晶硬质合金涂层刀具
6.科技部对俄科技合作专项：用于活塞环表面高性能涂层的环境友好PVD技术。以上项目主要成果如下：
-高性能涂层系列：TiAlN,CrN,Ti-Si-N,DLC,TiAlCrN,TiAlSiN,TiAlCrSiN,纳米复合涂层等。应用范围：硬质合金刀具、微钻、微铣、发动机活塞环、模具、纺织钢领等工件的表面涂层
-超厚与超硬涂层技术
-环境友好型替代电镀铬新技术
7.自主科研项目：穆斯堡尔谱与深空探测原位核分析技术
-常规Mossbauer测试，低温Mossbauer谱
-RBS-PIXE-ERD与穆斯堡尔谱相结合的测试表征技术
-铁基超导、多铁性材料及土壤分析
三、教学工作
大学物理学（本科生课程）
现代材料物理（研究生课程）
四、学术兼职
中国电工技术学会电子束离子束专业委员会副主任委员
粒子加速器学会理事
湖北省核学会荣誉理事
湖北省太阳能研究会副理事长
湖北省刀具协会副理事长
《核技术》期刊编委
Surf.Coat.Technol.,J.Phys.D,ChinesePhys.Lett.,Plasma.Sci.Technol.,J.AlloysCompounds,J.AmericanCeramicSoc.,J.Phys.Chem.等期刊评审人。
五、课题组成员
付德君（教授），郭立平（副教授），V.Pelenovich（博士后），陈义龙（教授，返聘），彭友贵（教授级高工，返聘），叶明生（实验师，返聘）
研究生：田灿鑫，王红军，王泽松，张早娣，闫少健，肖仁政，王世旭，卢志红，周霖，张瑞，王玲玲，林宝珠，尚艳霞，王薇，李银成，付酮程
六、合作伙伴
韩国东国大学，美国休斯顿大学，俄罗斯航空材料研究院，乌兹别克科学院
DejunFu,Professor
Tel/Fax:(86)-27-6875-3587
Email:djfu@whu.edu.cn
I.Education:
1981-1985,BSc,DepartmentofPhysics,WuhanUniversity.
1985-1988,MSc,DepartmentofPhysics,WuhanUniversity.
1996-1999,PhD,AcceleratorLaboratory,DepartmentofPhysics,WuhanUniversity
II.Carrier:
1988-1996,Lecturer,ThreeGorgesUniversity,DepartmentofPhysics.
1999-2001,Postdocfellow,Quantum-FunctionalSemiconductorResearchCenter(QSRC),DonggukUniversity,Korea.
2001-2004,ResearchProfessor,QSRC,DonggukUniversity,Korea.
2004-present,Professor,AcceleratorLaboratory,SchoolofPhysicsandTechnology,WuhanUniversity.
III.Researchinterest：
1.Plasma-enhancedphysicalvapordepositionofhardcoatingsforindustrialapplications.
2.Magneticsemiconductors,multiferroicmaterials,andtheirapplicationinspintronicsandmultibitmemories.
3.MossbauerspectroscopyofFeAs-basedsuperconductorsandotherFe-containingmaterials.
4.Hybridandinsituanalyticalinstrumentanddetectiontechnologies.
IV.Groupmembers：
DejunFu(professor),LipingGuo(associateprofessor,V.Pelenovich(postdoc).
Graduates:C.X.Tian,H.J.Wang,Z.S.Wang,Z.D.Zhang,S.J.Yan,R.Z.Xiao,S.X.Wang,Z.H.Lu,L.Zhou,R.Zhang,L.L.Wang,B.Z.Lin,Y.X.Shang，W.Wang,Y.C.Li,T.C.Fu
Emeritus:Y.L.Chen(professor),X.J.Fan(professor),Y.G.Peng(professor),J.R.Liu(professor),M.S.Ye(engineer)
V.Selectedpublications：
1.J.He,J.C.Lee,M.Li,Z.S.Wang,C.S.Liu,D.J.Fu,ComputerizedControlandOperationofRutherfordBackscattering/ChannelingforaninsituIonBeamSystemandItsApplicationforMeasurementofSi(001)andZnO(001),Chin.Phys.Lett.28(2011)012901.
2.J.He,Z.S.Wang,M.Li,D.J.Fu,StructuralandmagneticcharacterizationofcobaltimplantedGaNfilms,Nucl.Instr.Meth.B269(2011)1041.
3.U.V.Valiev,J.B.Gruber,D.J.Fu,V.O.Pelenovich,G.W.Burdick,M.E.Malysheva,SpecificfeaturesofEu3+andTb3+magnetoopticsingadolinium-galliumgarnet,J.RareEarth29(2011)776.
4.C.W.Zou,H.J.Wang,M.L.Yi,M.Li,C.S.Liu,L.P.Guo,D.J.Fu,T.W.Kang,Defectsrelatedroomtemperatureferromagnetisminp-type(Mn,Li)-dopedZnOfilmsdepositedbyreactivemagnetronsputtering,Appl.Surf.Sci.256(2010)2453.
5.M.Li,C.W.Zou,G.F.Wang,H.J.Wang,M.L.Yin,C.S.Liu,L.P.Guo,D.J.Fu,andT.W.Kang,Roomtemperatureferroelectricandmagneticpropertiesof(Co,Li)-implantedZnOfilms,J.Appl.Phys.107(2010)104117.
6.X.W.Ke,F.K.Shan,G.F.Wang,C.S.Liu,D.J.Fu,StructuralandRamanAnalysisofAntimony-ImplantedZnMnO,PlasmaSci.Technol.12(2010)92.
7.X.W.Ke,C.W.Zou,M.Li,C.S.Liu,L.P.Guo,D.J.Fu,StructureandMagneticPropertiesofMn-ImplantedZnOFilms,Jpn.J.Appl.Phys.49(2010)033001.
8.C.W.Zou,H.J.Wang,M.Li,Y.F.Yu,C.S.Liu,L.P.Guo,D.J.Fu,CharacterizationandpropertiesofTiN-containingamorphousTi–Si–Nnanocompositecoatingspreparedbyarcassistedmiddlefrequencymagnetronsputtering,Vacuum84(2010)817.
9.H.J.Wang,C.W.Zou,B.Yang,H.B.Lu,C.X.Tian,H.J.Yang,M.Li,C.S.Liu,D.J.Fu,J.R.Liu,Electrodepositionoftubular-rodstructuregoldnanowiresusingnanoporousanodicaluminaoxideastemplate,Electrochem.Commun.11(2009)2019.
10.C.W.Zou,H.J.Wang,M.L.Yin,M.Li,C.S.Liu,L.P.Guo,D.J.Fu,T.W.Kang,PreparationofGaNfilmsonglasssubstratesbymiddlefrequencymagnetronsputtering,J.CrystalGrowth311(2009)223.
11.Z.T.Yang,B.Yang,L.P.Guo,D.J.Fu,EffectofbiasvoltageonthestructureandhardnessofTi-Si-Ncompositecoatingssynthesizedbycathodicarcassistedmiddle-frequencymagnetronsputtering,J.AlloysCompounds473(2009)437.
12.Z.T.Yang,B.Yang,L.P.Guo,D.J.Fu,SynthesisofTi-Si-Nnanocompositecoatingsbyanovelcathodicarcassistedmiddle-frequencymagnetronsputtering,Appl.Surf.Sci.255(2009)4720.
13.C.X.Tian,B.Yang,J.He,H.J.Wang,S.Q.Rong,C.W.Zou,C.S.Liu,L.P.Guo,D.J.Fu,PreparationofCrNthickfilmsbyhigh-ratemiddle-frequencyunbalancedmagnetronsputtering,Vacuum83(2009)1459-1463.
14.M.L.Yin,M.Li,C.W.Zou,C.S.Liu,L.P.Guo,D.J.Fu,AlNfilmsdepositedbymiddle-frequencymagnetronsputteringwithandwithoutanode-layerionsourceassistance,J.Phys.D41(2008)085407.
15.Y.H.Kwon,T.W.Kang,Y.Shon,H.Y.Cho,H.C.Jeon,Y.S.Park,D.U.Lee,T.W.Kim,D.J.Fu,MagneticpropertiesofMn+-implantedandannealedSi1?xGexthinfilmsgrownonp-Si(100)substrates,SolidStateCommun.147(2008)161-164.
16.I.T.Yoon,C.J.Park,S.W.Lee,T.W.Kang,D.W.Koh,D.J.Fu,Ferromagnetisminself-assembledGequantumdotsmaterialfollowedbyMnimplantationandannealing,SolidStateElectronics52(2008)871-876.
17.L.P.Guo,C.S.Liu,M.Li,B.Song,M.S.Ye,D.J.Fu,X.J.Fan,EstablishmentofinsituTEM-implanter/acceleratorinterfacefacilityatWuhanUniversity,Nucl.Instr.Meth.A586(2008)143.
18.Y.Shon,H.C.Jeon,S.J.Lee,C.S.Park,E.K.Kim,D.J.Fu,X.J.Fan,Theappearanceofclearferromagnetismforp-typeInMnP:ZnimplantedwithMnof1at.%,Mater.Sci.EngrB146(2008)220-224.
19.C.W.Zou,M.Li,M.L.Yin,D.J.Fu,GaNfilmsdepositedbymiddle-frequencymagnetronsputtering,Appl.Surf.Sci.253(2007)9077.
20.X.W.Ke,F.K.Shan,Y.S.Park,Y.J.Wang,D.J.Fu,Opticalpropertiesofantimony-implantedZnOepilayers,Surf.Coat.Technol.201(2007)6797.
21.L.Liao,H.B.Lu,J.C.Li,C.Liu,D.J.Fuetal,ThesensitivityofgassensorbasedonsingleZnOnanowiremodulatedbyheliumionradiation,Appl.Phys.Lett.91(2007)173110.
22.M.L.Yin,C.W.Zou,D.J.Fu,Middle-frequencymagnetronsputteringforGaNgrowth,Nucl.Instr.Meth.B262(2007)189.
23.D.H.Kim,D.J.Lee,T.W.Kang,D.J.Fu,FerroelectricandmagneticpropertiesofCdMnSfilmspreparedbyco-evaporation,J.Appl.Phys.101(2007)094111.
24.B.Yang,Z.H.Huang,C.S.Liu,Z.Y.Zeng,X.J.Fan,D.J.Fu,CharacterizationandpropertiesofTi-containingamorphouscarbonnanocompositecoatings,Surf.Coat.Technol.200(2006)5812.
25.Y.Shon,S.J.Lee,H.C.Jeon,T.W.Kang,D.J.Fu,FerromagneticformationoftwophasesMnPandInMn3fromInMnP:Zn,Appl.Phys.Lett.88(2006)232511.
26.Y.Shon,S.J.Lee,H.C.Jeon,Y.S.Park,D.Y.Kim,T.W.Kang,J.S.Kim,E.K.Kim,D.J.Fu,X.J.Fan,Y.J.Park,Originofclearferromagnetismforp-typeGaNimplantedwithFe+of5-10at%,Appl.Phys.Lett.89(2006)082505.
27.I.T.Yoon,C.J.Park,T.W.Kang,D.J.Fu,MagneticandtransportpropertiesofMn-implantedGe/Siquantumdots,SolidStateCommun.140(2006)185.
28.Z.H.Huang,B.Yang,C.S.Liu,X.J.Fan,D.J.Fu,FormationofC3N4nanocrystalsinTi-dopedCNxfilmspreparedbyarc-assistedMFmagnetronsputtering,Jpn.J.Appl.Phys.45(2006)L562.
29.D.J.FuandT.W.Kang,Galliumnitridepyramidsfabricatedbyelectrolessetching,Jpn.J.Appl.Phys.44(2005)L342.
30.F.Ren,C.Z.Jiang,C.Liu,D.J.Fu,Y.Shi,InterfaceinfluenceonthesurfaceplasmonresonanceofAgnanoclustercomposite,SolidStateCommun.135(2005)268-272.
31.B.Yang,Z.H.Huang,C.S.Liu,Z.Y.Zeng,X.J.Fan,D.J.Fu,Ti-ContainingAmorphousCarbonNanocompositeCoatingsPreparedbyMeansofEight-TargetArc-AssistedMiddleFrequencyMagnetronSputtering,Jpn.J.Appl.Phys.44(2005)1022.
32.Y.S.Park,C.M.Park,D.J.Fu,T.W.Kang,J.E.Oh,PhotoluminescencestudiesofGaNnanorodsonSi(111)substratesgrownbymolecular-beamepitaxy,Appl.Phys.Lett.85(2004)5718.
33.Y.Shon,W.C.Lee,Y.S.Park,Y.H.Kwon,SeungJooLee,K.J.Chung,H.S.Kim,D.Y.Kim,D.J.Fu,Mn-implanteddilutemagneticsemiconductorInP:Mn,Appl.Phys.Lett.84(2004)2310.
34.Y.Shon,Y.H.Kwon,Y.S.Park,Y.Sh.Yuldashev,S.J.Lee,C.S.Park,K.J.Chung,S.J.Hoon,H.J.Kim,W.C.Lee,D.J.Fu,T.W.Kang,Ferromagneticbehaviorofp-typeGaNepilayerimplantedwithFeions,J.Appl.Phys.95(2004)761.
35.M.K.Li,C.B.Li,C.S.Liu,X.J.Fan,D.J.Fu,Y.Shon,T.W.Kang,OpticalandmagneticmeasurementsofMn+-implantedAlN,J.Appl.Phys.95(2004)755.
36.Y.Shon,W.C.Lee,Y.S.Park,Y.H.Kwon,SeungJooLee,K.J.Chung,H.S.Kim,D.Y.Kim,D.J.Fu,T.W.Kang,X.J.Fan,Y.J.Park,Mn-implanteddilutemagneticsemiconductorInP:Mn,Appl.Phys.Lett.84(2004)2310.
37.D.J.Fu,J.C.Lee,S.W.Choi,C.S.Park,G.P.Panin,T.W.Kang,X.J.Fan,FerroelectricityinMn-implantedCdTe,Appl.Phys.Lett.83(2003)2214.
38.D.J.Fu,J.C.Lee,S.W.Choi,S.J.Lee,T.W.Kang,M.S.Jang,H.I.LeeandY.D.Woo,Studyofferroelectricityandcurrent–voltagecharacteristicsofCdZnTe,Appl.Phys.Lett.81(2002)5207.
39.D.J.FuandT.W.Kang,ElectricalpropertiesofGaN-basedmetal-oxide-semiconductorstructuresfabricatedbyphotoelectrochemicaloxidation,Jpn.J.Appl.Phys.41(2002)L1437.
40.D.J.Fu,Y.H.Kwon,T.W.Kang,C.J.Park,K.H.Baek,H.Y.Cho,D.H.Shin,C.H.Lee,GaNmetal-oxide-semiconductorstructuresusingGa-oxidedielectricsformedbyphotoelectrochemicaloxidation,Appl.Phys.Lett.80(2002)446.
41.Y.H.Kwon,C.J.Park,W.C.Lee,D.J.Fu,Y.Shon,T.W.Kang,C.Y.Hong,H.Y.Cho,K.L.Wang,Memoryeffectsrelatedtodeeplevelsinmetal–oxide–semiconductorstructurewithnanocrystallineSi,Appl.Phys.Lett.80(2002)2502.
42.Y.Shon,Y.H.Kwon,Sh.U.Yuldashev,J.H.Leem,C.S.Park,D.J.Fu,H.J.Kim,T.W.Kang,X.J.Fan,Opticalandmagneticmeasurementsofp-typeGaNepilayersimplantedwithMnions,Appl.Phys.Lett.81(2002)1845.
43.Y.Shon,Y.H.Kwon,D.Y.Kim,X.Fan,D.J.Fu,T.W.Kang,MagneticCharacteristicofMnionimplantedGaNepilayer,Jpn.J.Appl.Phys.40(2001)5304.
44.D.J.Fu,T.W.Kang,Sh.U.Yudalshev,N.H.Kim,S.H.Park,J.S.Yun,K.S.Chung,EffectofphotoelectrochemicaloxygenationonpropertiesofGaNepilayersgrownbyMBE,Appl.Phys.Lett.78(2001)1309.
45.D.J.Fu,Sh.U.Yudalshev,N.H.Kim,Y.S.Ryu,J.S.Yun,S.H.Park,T.W.Kang,AstudyofphotoelectrochemicaloxidationofGaNepilayersbyextrinsicphotoconductivity,Jpn.J.Appl.Phys.40(2001)L10.
46.D.J.Fu,Y.Y.Lei,J.C.Li,M.S.Ye,H.X.Guo,Y.G.Peng,X.J.Fan,DopingandphotoelectricpropertiesofC60filmspreparedbyionizedclusterbeamdeposition,Appl.Phys.A67(1998)441.
47.D.W.Wu,Z.Zhang,D.J.Fu,X.J.Fan,Structure,electricalandchemicalpropertiesofZrNdepositedbydcreactivemagnetronsputtering,Appl.Phys.A64(1997)593.
48.D.W.Wu,D.J.Fu,H.X.Guo,Z.H.Zhang,X.Q.Meng,X.J.Fan,StructureandcharacteristicsofC3N4filmspreparedbyrfplasmaenhancedchemicalvapordeposition,Phys.Rev.B56(1997)4949.
49.S.C.Chen,H.Zhang,D.J.Fu,Boronimplantationofdiamond-likecarbonfilms,Vacuum39(1989)183.
50.C.S.Chen,D.J.Fu,H.Zhang,X.Z.Pan,Areactionsputteringtyperfionsourceforsolidelements,Nucl.Instr.Meth.B37-38(1989)136.
