叶辉教授

summary
Hui Ye (葉輝,Yip Fei)
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\rProfessor in Department of Optical Engineering, Zhejiang University. He received the B.S. degree in Department of Material Science and Engineering, Zhejiang University, in 1990; and received the Ph.D degree in Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Science, in 1995. Dr.Ye then joined Institute of Optoelectronic Display, Zhejiang University. He was a visiting scholar in Department of Material Science and Engineering at University of California, Los Angeles (UCLA) from Dec.1998 to Dec.1999, and was a research associate in Department of Applied Physics at Hong Kong Polytechnic University from Nov.2000 to May. 2001, respectively.
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\rDr. Ye was financially supported by National Basic Research Program of China, National Natural Scientific Foundation of China (NSFC) and NSF of Zhejiang Province, he has published more than 60 papers as the first\/corresponding author. His research interest is focused on silicon photonics, including:
\r(1) Growth of Si\/Ge quantum dots and Si\/Ge epitaxial films with the MBE method,
\r(2) Light emiting enhancement based on surface plasmon resonance,
\r(3) Fabrication and characterization of novel surface plasmonic materials,
\r(4) Deposition and optical properties study of silicon based ferroelectric films and piezoelectric films.

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硅基光子学（硅基锗的外延生长研究，表面等离子体增强硅基发光，新型表面等离子体材料研究），光电子薄膜材料与器件，铁电与压电薄膜
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1
opendate
2008-01-14 09:03:56
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56357
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selfintroduction
Hui Ye (葉輝,Yip Fei)
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\rProfessor in Department of Optical Engineering, Zhejiang University. He received the B.S. degree in Department of Material Science and Engineering, Zhejiang University, in 1990; and received the Ph.D degree in Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Science, in 1995. Dr.Ye then joined Institute of Optoelectronic Display, Zhejiang University. He was a visiting scholar in Department of Material Science and Engineering at University of California, Los Angeles (UCLA) from Dec.1998 to Dec.1999, and was a research associate in Department of Applied Physics at Hong Kong Polytechnic University from Nov.2000 to May. 2001, respectively.
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\rDr. Ye was financially supported by National Basic Research Program of China, National Natural Scientific Foundation of China (NSFC) and NSF of Zhejiang Province, he has published more than 60 papers as the first\/corresponding author. His research interest is focused on silicon photonics, including:
\r(1) Growth of Si\/Ge quantum dots and Si\/Ge epitaxial films with the MBE method,
\r(2) Light emiting enhancement based on surface plasmon resonance,
\r(3) Fabrication and characterization of novel surface plasmonic materials,
\r(4) Deposition and optical properties study of silicon based ferroelectric films and piezoelectric films.

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email
huiye@zju.edu.cn
address
玉泉校区第三教学楼418室
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1850
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47f5aad**e891ca0242ac110003
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1
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2021-01-24 21:19:48
content
Hui Ye (葉輝,Yip Fei)
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\rProfessor in Department of Optical Engineering, Zhejiang University. He received the B.S. degree in Department of Material Science and Engineering, Zhejiang University, in 1990; and received the Ph.D degree in Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Science, in 1995. Dr.Ye then joined Institute of Optoelectronic Display, Zhejiang University. He was a visiting scholar in Department of Material Science and Engineering at University of California, Los Angeles (UCLA) from Dec.1998 to Dec.1999, and was a research associate in Department of Applied Physics at Hong Kong Polytechnic University from Nov.2000 to May. 2001, respectively.
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\rDr. Ye was financially supported by National Basic Research Program of China, National Natural Scientific Foundation of China (NSFC) and NSF of Zhejiang Province, he has published more than 60 papers as the first\/corresponding author. His research interest is focused on silicon photonics, including:
\r(1) Growth of Si\/Ge quantum dots and Si\/Ge epitaxial films with the MBE method,
\r(2) Light emiting enhancement based on surface plasmon resonance,
\r(3) Fabrication and characterization of novel surface plasmonic materials,
\r(4) Deposition and optical properties study of silicon based ferroelectric films and piezoelectric films.

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个人简介