导师介绍

导师姓名
JonTomasGudmundsson
导师性别男
职务职称副教授.
所在院系上海交大-密西根大学联合学院
所属学科电子科学与技术
研究方向等离子化学与等离子诊断超薄金属膜与新型纳米器件
联系电话34207938
电子邮箱tumi@raunvis.hi.is

个人简介

EDUCATIONPh.D.inNuclearEngineering,December1996UniversityofCalifornia,Berkeley,CaliforniaM.S.inPhysics,February1991UniversityofIceland,Reykjavik,IcelandC.S.(candidatusscientarum)inElectricalEngineering,June1989UniversityofIceland,Reykjavík,IcelandWORKEXPERIENCEProfessor,DepartmentofElectricalandComputerEngineering,FacultyofEngineering,UniversityofIceland,October2003=August2010AssociateProfessor,DepartmentofElectricalandComputerEngineering,FacultyofEngineering,UniversityofIceland,fromFebruary2001untilSeptember2003.AssistantProfessor,DepartmentofElectricalandComputerEngineering,FacultyofEngineering,UniversityofIceland,January2001.AssociateResearchScientist,ScienceInstitute,UniversityofIcelandfromMay2000untilDecember2000.AssistantResearchScientist,ScienceInstitute,UniversityofIcelandfromSeptember1997untilApril2000.
代表性论著

J.T.Gudmundsson,P.Sigurjonsson,P.Larsson,D.Lundin,andU.Helmersson,Ontheelectronenergyinthehighpowerimpulsemagnetronsputteringdischarge,JournalofAppliedPhysics,105(12)(2009)123302E.G.ThorsteinssonandJ.T.Gudmundsson,Aglobal(volumeaveraged)modelofthenitrogendischarge:I.SteadyState,PlasmaSourcesScienceandTechnology,18(4)(2009)045001E.G.ThorsteinssonandJ.T.Gudmundsson,Aglobal(volumeaveraged)modelofthenitrogendischarge:II.PulsedPowerModulation,PlasmaSourcesScienceandTechnology,18(4)(2009)045002A.S.Ingason,F.Magnus,J.S.Agustsson,S.Olafsson,andJ.T.Gudmundsson,In-situelectricalcharacterizationofultrathinTiNfilmsgrownbyreactivedcmagnetronsputteringonSiO$_2$,ThinSolidFilms,517(24)(2009)6731-6736E.G.ThorsteinssonandJ.T.Gudmundsson,Aglobal(volumeaveraged)modelofachlorinedischarge,PlasmaSourcesScienceandTechnology,19(1)(2010)015001E.G.ThorsteinssonandJ.T.Gudmundsson,Aglobal(volumeaveraged)modelofaCl$_2$/Ardischarge:I.Continuouspower,JournalofPhysicsD:AppliedPhysics,43(11)(2010)115201E.G.ThorsteinssonandJ.T.Gudmundsson,Aglobal(volumeaveraged)modelofaCl$_2$/Ardischarge:II.PulsedPowerModulation,JournalofPhysicsD:AppliedPhysics,43(11)(2010)115202A.S.Ingason,F.Magnus,S.OlafssonandJ.T.Gudmundsson,MorphologyofTiNthinfilmsgrownonMgO[100]byreactivedcmagnetronsputtering,JournalofVacuumScienceandTechnologyA,28(4)(2010)912-915J.T.Gudmundsson,Thehighpowerimpulsemagnetronsputteringdischargeasanionizedphysicalvapordepositiontool,Vacuum,84(12)(2010)1360-1364M.Samuelsson,D.Lundin,J.Jensen,M.A.Raadu,J.T.GudmundssonandU.Helmersson,Onthefilmdensityusinghighpowerimpulsemagnetronsputtering,SurfaceandCoatingsTechnology,202(2)(2010)591-596E.G.ThorsteinssonandJ.T.Gudmundsson,ThelowpressureCl$_2$/O$_2$dischargeandtheroleofClO,PlasmaSourcesScienceandTechnology,19(5)(2010)055008A.T.Hjartarson,E.G.ThorsteinssonandJ.T.Gudmundsson,Lowpressurehydrogendischargesdilutedwithargonexploredusingaglobalmodel,PlasmaSourcesScienceandTechnology,19(6)(2010)065008D.M.Danielsson,J.T.GudmundssonandH.G.Svavarsson,Theeffectofhydrogenationontheminoritycarrierlifetimeinlowgradesilicon,PhysicaScripta,T141(2010)014005F.Magnus,A.S.Ingason,S.OlafssonandJ.T.Gudmundsson,Growthandin-situelectricalcharacterizationofultrathinepitaxialTiNfilmsonMgO,ThinSolidFilms,519(18)(2011)5861-5867J.T.GudmundssonandM.A.Lieberman,Ar$^+$andXe$^+$velocitiesnearthepresheath-sheathboundaryinanAr/Xedischarge,PhysicalReviewLetters,107(4)(2011)045002F.Magnus,O.B.Sveinsson,S.OlafssonandJ.T.Gudmundsson,Current-voltage-timecharacteristicsofthereactiveAr/N$_2$highpowerimpulsemagnetronsputteringdischarge,JournalofAppliedPhysics,110(8)(2011)083306M.A.Raadu,I.Axnäs,J.T.Gudmundsson,C.HuoandNBrenning,Anionizationregionmodelforhigh-powerimpulsemagnetronsputteringdischarges,PlasmaSourcesScienceandTechnology,20(6)(2011)065007F.Magnus,A.S.Ingason,O.B.Sveinsson,S.OlafssonandJ.T.Gudmundsson,MorphologyofTiNthinfilmsgrownonSiO$_2$byreactivehighpowerimpulsemagnetronsputtering,ThinSolidFilms,520(5)(2011)1621-1624J.T.Gudmundsson,A.T.Hjartarson,andE.G.Thorsteinsson,Theinfluenceoftheelectronenergydistributiononthelowpressurechlorinedischarge,Vacuum,86(7)(2012)808-812J.T.Gudmundsson,N.Brenning,D.LundinandU.Helmersson,Highpowerimpulsemagnetronsputteringdischarge,JournalofVacuumScienceandTechnologyA,30(3)(2012)030801