导师介绍

导师姓名
董显平
导师性别男
职务职称副研究员.
所在院系材料科学与工程学院
所属学科材料科学与工程
研究方向电子薄膜材料高温结构材料
联系电话54747471
电子邮箱xpdong@sjtu.edu.cn

个人简介

董显平，博士，副教授，1967年11月生。1995年3月获哈尔滨工业大学硕士学位，2003年2月获上海交通大学博士学位；1995年3月至今，任教于上海交通大学材料学院。多年来，在金属间化合物材料成型技术、陶瓷材料烧结技术以及溅射靶材与薄膜性能之间非线性关系机理等方面开展了大量的研究工作。主要研究方向：电子薄膜材料、高温结构材料、硬磁材料；侧重于电阻薄膜、栅极薄膜、透明导电氧化物薄膜、磁性薄膜以及相关薄膜材料的环境稳定性等方面研究。申请专利8项，发表论文60余篇（其中多数为SCI、EI收录文章），曾主持及参与的纵向课题项目共12项，获上海市科技进步三等奖一项。
代表性论著

[1]XianpingDong,BoZhangandJianshengWu.Optical-electricalpropertiesandcorrosionbehavioroftantalum-dopedindiumtinoxidefilmdepositedbymagnetronsputtering.MaterialsScienceForum，2010,638-642:2897-2902[2]XianpingDongandJianshengWu.TheroleofaluminuminthecrystallizationofCr-Si-Niresistivefilms.MaterialScienceandEngineeringA,2003,339(1/2):297~301.[3]XianpingDongandJianshengWu.TheeffectofzirconiumonthecrystallizationbehaviorandelectricalpropertiesofCr-Si-Alresistivefilms.MaterialScienceandEngineeringA,2004,371(1/2):1~8.[4]XianpingDongandJianshengWu.FormationofanintermetallicphasebycrystallizationinCr-Si-Ni-Alamorphousfilms.JournalofAlloysandCompounds,2003，359(1):256~260.[5]XianpingDongandJianshengWu.ThecrystallizationofCr-Si-Ni-Alamorphousfilms:NucleationandgrowthofintermetallicphaseCr(Al,Si)2.Intermetallics,2003，11(8):779~785.[6]DongXPandWuJS.StudyonthecrystallizationofamorphousCr-Si-NithinfilmsusinginsituX-raydiffraction.J.Mater.Sci.Technol.,2001,17:s43-46.[7]YuqinZhang,XianpingDongandJianshengWu.MicrostructureandelectricalcharacteristicsofCr-Si-NifilmsdepositedonglassandSi(100)substratesbyRFmagnetronsputtering.MaterialScienceandEngineeringB,2004,113:154~160.[8]YuqinZhang,XianpingDongandJianshengWu.CorrosionbehaviorofsputteredCr-Si-Niresistivefilmsinacidicandalkalineenvironments.MaterialChemistryandPhysics,2005,93:348~355.[9YuqinZhang,XianpingDongandJianshengWu.EnvironmentaleffectsonelectricalpropertiesofCr–Si–Niresistivefilmsdepositedbymagnetronsputtering.MaterialsScienceandEngineeringB,2005,122:121~126.[10]YuqinZhang,XianpingDongandJianshengWu.CorrosionbehaviorofsputteredCr–Si–NiandCr–Si–Ni–Alresistivefilmsin0.1MNaOH.AppliedSurfaceScience,2006,252:2702~2710.[11]ZhangB,DongXP,XuXFandWuJS.Preparationandcharacterizationoftantalum-dopedindiumtinoxidefilmsdepositedbymagnetronsputtering,ScriptaMaterialia,2008,58:203-206.[12]ZhangB,DongXP,XuXF,ZhaoPandWuJS.Characteristicsofzirconium-dopedindiumtinoxidethinfilmsdepositedbymagnetronsputtering,SolarEnergyMaterialsandSolarCells,2008,92:1224-1229.[13]ZhangB,DongXP,XuXF,WangXJandWuJS.ElectricalandopticalpropertiesofITOandITO:Zrtransparentconductingfilms,MaterialsScienceinSemiconductorProcessing,2007,10:264-269.[14]ZhangB,DongXP,XuXFandWuJS.TransparentconductiveTa2O5-codopedITOthinfilmspreparedbydifferentheatingprocess,PhysicaStatusSolidi(a),2008,205:1162-1167.[15]ZhangB,DongXP,XuXFandWuJS.PropertiesofITO:Zrfilmsdepositedbyco-sputtering,OptoelectronicsLetters,2008,4:137-139.[16]WangXJ,DongXP,JiangCH,WuJS.Theeffectofchromiumdopantonthemicrostructureandmechanicalpropertiesofsputter-depositedcopperfilms.Surface&CoatingsTechnology,2009,203:3005–3010.[17]WangXJ,DongXP,WuJS.EffectsofCrdopantonthemicrostructureandelectromigrationperformanceofCuinterconnects.AppliedSurfaceScience,2009,255:9273–9278.[18]FangWang,AidangShan,XianpingDongandJianshengWu.Microstructureandoxidationresistanceoflaser-remeltedMo-Si-Balloy.ScriptaMaterialia,2007,56:737–740.[19]QiongzhenLiu,LantingZhang,XianpingDong,FangXuandMatahiroKomuro.IncreasedcoercivityinsinteredNd–Fe–BmagnetswithNdF3additionsandtherelatedgrainboundaryphase.ScriptaMaterialia,2009,61:1048–1051.