中文题目: 基于粒子群优化算法的光刻机光源掩模投影物镜联合优化方法
外文题目: Source Mask Projector Optimization Method of LithographyTools Based on Particle Swarm Optimization Algorithm
作者: 王磊; 李思坤; 王向朝; 杨朝兴
刊名: 光学学报
年: 2017 卷: 37 期: 10 文章编号：1022001
中文关键词:
光学制造; 光刻; 分辨率增强技术; 光源掩模投影物镜联合优化; 粒子群优化
英文关键词:

optical fabrication; optical lithography; resolution enhancement technique; source mask projector optimization; particle swarm optimization
中文摘要:
全芯片多参数联合优化是光刻分辨率增强技术的重要发展方向。提出了一种基于粒子群优化(PSO)算法的光源掩模投影物镜联合优化(SMPO)方法。将由像素表征的光源、由离散余弦变换基表征的掩模及由泽尼克系数表征的投影物镜编码为粒子,以图形误差作为评价函数,通过不断迭代更新粒子,实现光源掩模投影物镜联合优化。在标称条件和工艺条件下,采用含有交叉门的复杂掩模图形对所提方法的仿真验证表明,图形误差分别降低了94.2%和93.8%,有效提高了光刻成像质量。与基于遗传算法的SMPO方法相比,该方法具有更快的收敛速度。此外,该方法具有优化自由度高和优化后掩模可制造性强的优点。

英文摘要:
Full-chip multi-parameter optimization is an important development direction of resolution enhancement techniques in optical lithography.A source mask projector optimization (SMPO)method based on particle swarm optimization(PSO)algorithm is proposed.The pixels are used to represent source.The discrete cosine transform basis functions are used to represent the mask.The coefficients of Zernike polynomials are used to represent the projector. The source,the mask and the projector are encoded into particles.The pattern error is adopted as the evaluation function and the particles are updated iteratively to realize the SMPO.This method is simulated and verified by using the complex mask pattern with cross gate design in nominal condition and process condition.Results show that the pattern errors are reduced by 94.2%and 93.8%,respectively,and the quality of lithography imaging is effectively improved.Compared with SMPO method based on genetic algorithm,the proposed method has a faster convergence rate.Besides,the proposed method has the advantages of high degree of optimized freedom and enhanced manufacturability of the optimized mask pattern.


文献类型: 期刊论文
正文语种: Chinese
收录类别: CSCD
DOI: 10.3788/AOS201737.1022001


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