中文题目: 退火对金属介质多层膜的界面扩散及抗化学清洗性能的影响
外文题目: Influence of Annealing on Interface Diffusion and Anti-Chemica-Cleaning Property of Metal-Dielectric Multilayer Films
作者: 张洪; 晋云霞; 孔钒宇; 黄昊鹏; 崔云; 胡国行; 李响潭; 葛雯娜; 叶邦角
刊名: 中国激光
年: 2016 卷: 43 期: 10 页： 1003002
中文关键词:
材料; 界面扩散; 化学清洗; 退火; 粘附力
英文关键词:

materials; interface diffusion; chemical cleaning; annealing; adhesion
中文摘要:
对金属介质多层膜样品进行不同温度的退火处理。实验发现,当退火温度为350°C时,在样品Au层与 SiO_2层的界面处出现过渡层,样品具有很强的抗化学清洗能力。利用透射电子显微镜观测与能谱仪分析发现,过渡层的出现主要是Cr原子从Au层底部扩散到SiO_2层的结果。过渡层可以增强Au层与SiO_2层间的粘附力,阻挡酸溶液的渗入,使得金属介质多层膜的抗化学清洗能力得到增强。

英文摘要:
Samples of metal-dielectric multilayer films are post-annealed at different temperatures. It is experimentally found that at the annealing temperature of 350℃,a transition layer between Au layer and SiO_2 layer of the samples occurs, and these samples possess the strong anti-chemical-cleaning ability. Based on the investigation by a transmission electron microscope and the analysis by an energy dispersive spectrometer, it is found that the occurrence of transition layers is mainly the result of Cr atoms diffusing from the Au bottom layer to the SiO_2 layer. The transition layer can enhance the adhesion between the Au layer and SiO_2 layer and block the infiltration of acid solutions, thus the anti-chemical-cleaning ability of metal-dielectric multilayer films is enhanced.


文献类型: 期刊论文
正文语种: Chinese
收录类别: CSCDEI
DOI: 10.3788/CJL201643.1003002


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