熊诗圣
微纳系统中心
职称：研究员、博导
职务：
电子邮件：sxiong@fudan.edu.cn
办公地点：遗传学楼
电话：
课题组主页：





研究兴趣
学术任职
获奖情况
学习工作经历
授课情况
代表性论文或专著

1. 光刻与微纳尺度制造工艺

面向10纳米以下工艺节点的导向自组装光刻工艺
激光直写光刻，3D增材制造


2.新型微纳电子器件与系统
基于神经形态器件的类脑计算芯片
高通量植入式神经电极阵列及芯片

AAAS member
SPIE member


Journal of Microelectronic Manufacturing
微电子制造 期刊编委

特聘

武汉大学，学士/硕士
美国新墨西哥大学/桑迪亚国家实验室 博士
美国威斯康星大学麦迪逊分校 博士后
美国西部数据公司 研发科学家
美国芝加哥大学/阿贡国家实验室 研究员

微系统技术 （春季）
智能微纳系统（秋季）
存算一体化技术 （秋季）

近五年主要发表论文


1. Jacobberger Robert M, Thapar Vikram, et al,Boundary-directed epitaxy of block copolymers. Nature communications, 2020, 4151.
2. Yu Chen, Shisheng Xiong*, Directed self-assembly of block copolymers for sub-10nm fabrication. International Journal of Extreme Manufacturing, 2020, 2(3).
3.Ziying Zhang, Pingping Xu, Ying Weng, Yangyang Zhou, Zaicheng Sun,Shisheng Xiong*, Nanotube network arrays with nickel oxide canopies as flexible high-energy anodes for lithium storage. Journal of Alloys and Compounds, 2020, 847.
4. Yangqiang Zhao, Ziying Zhang, Huizhen Zhang,Yangyang Zhou, Ying Weng, Shisheng Xiong*, Three-Dimensional PrGO-Based Sandwich Composites With MoS2 Flowers as Stuffings for Superior Lithium Storage. Frontiers in Chemistry, 2020, 8(94).
5. Karl Berggren, Qiangfei Xia, et al, Roadmap on emerging hardware and technology for machine learning. Nanotechnology, 2020.
6. Baolin Zhang, Yu Chen, Shisheng Xiong*, Self-assembly of Blended PS-b-P2VP Block Copolymers. Journal of Microelectronic Manufacturing, 2020, 2(4) .
7. Dongxue Li, Chun Zhou, Shisheng Xiong*, Xin-Ping Qu, Gordon S. W. Craig, Paul F. Nealey, Enhanced microphase separation of thin films of low molecular weight block copolymer by the addition of an ionic liquid. Soft Matter, 2019, 15(48).
8. Chun Zhou, Moshe Dolejsi, Shisheng Xiong, Jiaxing Ren, Elizabeth Michiko Ashley, Gordon S W Craig, Paul F Nealey, Combining block copolymer lithography with self-aligned double patterning to achieve 10.5 nm full-pitch line/space patterns. Nanotechnology, 2019, 30(45).
9. Dongxue Li, Liang Chien, Xinnian Wei, Xinping Qu, Tzu-Hsuan Chang, Shisheng Xiong*, Sub-10 nm silicon FinFET devices on SOI substrate made by block copolymer lithography. IEEE ICSICT conference, 2018.
10. Shisheng Xiong*, Dongxue Li, Su-Mi Hur, Gordon S. W. Craig, Christopher G. Arges, Xin-Ping Qu, and Paul F. Nealey, The Solvent Distribution Effect on the Self-Assembly of Symmetric Triblock Copolymers during Solvent Vapor Annealing. Macromolecules, 2018, 51(18).
11. Qi Zhang, Fumiaki Matsuoka, Hyo Seon Suh, Peter A Beaucage, Shisheng Xiong, Detlef-M Smilgies, Kwan Wee Tan, J?rg G Werner, Paul F Nealey, Ulrich B Wiesner, Pathways to Mesoporous Resin/Carbon Thin Films with Alternating Gyroid Morphology. ACS nano, 2017.
12. Tzu-Hsuan Chang#, Shisheng Xiong#, Chi-Chun Liu, Dong Liu, Paul F. Nealey, Zhenqiang Ma, The One-Pot Directed Assembly of Cylinder-Forming Block Copolymer on Adjacent Chemical Patterns for Bimodal Patterning. Macromolecular Rapid Communications, 2017.
13. Guanwen Yang, Guangpeng Wu, Xuanxuan Chen, Shisheng Xiong, Christopher Arges, Shengxiang Ji, Paul Nealey, Xiao-Bing Lu, Donald J. Darensbourg, Zhi-Kang Xu, Directed Self-Assembly of Polystyrene-b -poly(propylene carbonate) on Chemical Patterns via Thermal Annealing for Next Generation Lithography. Nano Letters, 2017, 17(2).
14. Tamar Segal-Peretz, Jiaxing Ren, Shisheng Xiong, Gurdaman Khaira, Alec Bowen, Leonidas E Ocola, Ralu Divan, Manolis Doxastakis, Nicola J Ferrier, Juan de Pablo, Paul F Nealey, Quantitative Three-Dimensional Characterization of Block Copolymer Directed Self-Assembly on Combined Chemical and Topographical Prepatterned Templates. ACS Nano, 2017, 11(2).
15.Hyo Seon Suh, Do Han Kim, Priya Moni, Shisheng Xiong, Leonidas E. Ocola, Nestor J. Zaluzec, Karen K. Gleason, Paul F. Nealey, Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat. Nature Nanotechnology, 2017, 12.
16. J Ren, L E Ocola, R Divan, D A Czaplewski, T Segal-Peretz, S Xiong, R J Kline, C G Arges, P F Nealey, Post-directed-self-assembly membrane fabrication for in situ analysis of block copolymer structures. Nanotechnology, 2016, 27(43).
17. Shisheng Xiong, Yves-Andre Chapuis, Lei Wan, He Gao, Xiao Li, Ricardo Ruiz, Paul F Nealey, Directed self-assembly of high-chi block copolymer for nano fabrication of bit patterned media via solvent annealing. Nanotechnology, 2016.
18. Shisheng Xiong, Lei Wan, Yoshihito Ishida, Yves-Andre Chapuis, Gordon S W Craig, Ricardo Ruiz, Paul F Nealey, Directed Self-Assembly of Triblock Copolymer on Chemical Patterns for Sub-10-nm Nanofabrication via Solvent Annealing. ACS Nano, 2016.
19. Tzu-Hsuan Chang#, Shisheng Xiong#, Robert M Jacobberger, Solomon Mikael, Hyo Seon Suh, Chi-Chun Liu, Dalong Geng, Xudong Wang, Michael S Arnold, Zhenqiang Ma*, Paul F Nealey*, Directed self-assembly of block copolymer films on atomically-thin graphene chemical patterns. Scientific reports, 2016, 6.