李伟
职称：教授、博导
电话：**
邮箱：wli@uestc.edu.cn



学习及工作经历
1978.09-1982.07四川大学（成都科技大学）金属材料系本科；1982.08-2004.03，四川大学助教、讲师（1990）、副教授（1994）、教授（2002），曾任教研室副主任/主任、系主任。1986.09 - 1989.07在四川大学在职攻读“材料加工工程”研究生，获工学硕士学位；1998.09 - 2003.12在四川大学在职攻读“材料学”博士研究生，获工学博士学位。2004.04调入电子科技大学光电科学与工程学院、电子薄膜与集成器件国家重点实验室工作。
研究方向及成果
研究方向：在四川大学期间，主要从事金属材料及金属基复合材料的科学研究。进入电子科技大学后，主要从事光电薄膜材料与器件、敏感薄膜材料与传感器等方面的科学研究。目前研究兴趣和主攻方向：1）无机/有机忆阻薄膜制备及性能优化；2）忆阻神经突触器件制备及应用；3）硅基光电功能薄膜材料及器件应用。
获奖情况：获省部级科技进步和技术发明奖励：一等奖1项、二等奖3项、三等奖1项。
论文与专利情况
在国内外学术刊物及会议上发表论文120余篇，SCI/EI收录80余篇；获授权美国发明专利2项、中国发明专利30余项。近期论文如下：
Nasir Ilyas,Dongyang Li,Yuhan Yuan, Xiangdong Jiang,Wei Li^*,Bi-Directional Analog SynapticBehaviorofSiO_x:Ag-based Diffusive Memristor,2019 MRS Spring Meeting,April 22-26, 2019,Phoenix, USA.
Yuhan Yuan,Nasir Ilyas,Zhihui Qi,Dongyang Li, Jiangdong Jiang,Wei Li^*,Bi-polar SynapticBehavior of Pt/SiO_x:Ag/TiO_x/p⁺⁺-SiMemristor,ISAMSE 2019, August 16-18, 2019, Shanghai, China.
Dongyang Li,Nasir Ilyas,Yuhao Song,Hao Zhong,Wei Li^*,Yadong Jiang,Inhomogeneous crystallization of a-Si thin films irradiatedby femtosecond laser, Journal of Raman Spectroscopy,Vol.50, 2019, pp793-801.
Chong Wang,Hao Zhong,Eddy Simoen,Xiang-Dong Jiang,Ya-Dong Jiang,Wei Li^*,Structural Variation and Its Influence on the 1/?Noise of a-Si_1??Ru_?Thin FilmsEmbedded with Nanocrystals,CHIN. PHYS. LETT. Vol. 36, No.2,2019,pp028101-5.
王冲，赵明，Eddy Simoen，李伟^*，Ni-Au/AlN/Si器件的深能级瞬态谱研究，半导体光电，Vol.40, No.4, 2019, pp494-498.
李东阳，Ilyas Nasir，宋宇浩，袁余涵，李伟^*，非晶硅银薄膜的飞秒激光辐照研究，中国激光，Vol.46, No.11, 2019, **-1(6).
MXu,C Wang, T Bearda, E Simoen^*, H S Radhakrishnan,I Gordon,W Li, J Szlufcik, and JPoortmans,Dry Passivation Process for Silicon HeterojunctionDry Passivation Process for Silicon HeterojunctionFollowed byIn Situa-Si:H Deposition,IEEEJofPhotovoltaics,Vol.8, No.6, 2018, pp1539-1545.
Nasir Ilyas,Dongyang Li,Yuhao Song,Hao Zhong,Yadong JiangandWei Li^*,Low-Dimensional Materials and State-of-the-ArtArchitectures for Infrared Photodetection,Sensors,Vol.18,No.12, 2018, pp4162-4184. (review)
Hao Zhong,Nasir Ilyas,Yuhao Song,Wei Li^*and Yadong Jiang,Enhanced near-infrared absorber: two-stepfabricated structured black silicon and itsdevice application, Nanoscale Research Letters, 13(2018)316(6pp).
Chong Wang^*,Eddy Simoen,Ming ZhaoandWei Li,Impact of the silicon substrate resistivity andgrowth condition on the deep levels in Ni-Au/AlN/Si MIS Capacitors,Semicond. Sci. Technol. 32 (2017)105002 (6pp).
Hao Zhong,Anran Guo,Guohui Guo,Wei Li^*and Yadong Jiang,The Enhanced Light Absorptance andDevice Application of Nanostructured BlackSilicon Fabricated by Metal-assistedChemical Etching, Nanoscale Research Letters, 11(2016)322 (6pp).
Anran Guo,Hao Zhong,Wei Li^*,Deen Gu,XiangdongJiang,Yadong Jiang,Band engineering of amorphous silicon ruthenium thin film and itsnear-infrared absorption enhancement combined with nano-holespatternon back surface of silicon substrate,Appl. Surf. Sci. 384(2016)487-491.
Anran Guo,DongyangLi,WeiLi^*,DeenGu,XiangdongJiang,YadongJiang,The relation of structure and dispersion to amorphous silicon silverthin films,Mater. Lett. 185(2016)5-8.
Anran Guo,Wei Li^*,Xiangdong Jiang,Chong Wang and Yadong Jiang,Raman analysis of amorphous silicon rutheniumthin films embedded with nanocrystals, Journal of Raman Spectroscopy,Vol.46, 2015, pp619-623.
Anran Guo,WeiLi^*,XiangdongJiang,ChongWang,ManhuiLu,YadongJiang,Structural variation and electrical properties of amorphous siliconruthenium thin films embeddedwithnanocrystals,Mater. Lett. 143(2015)80-83.
Rui Xu,Jian He,Wei Li^*,David C. Paine^*,Performance enhancement of amorphous indium-zinc-oxide thin filmtransistors by microwave annealing,Appl. Surf. Sci. 357(2015)1915-1919.
Jian He^*,WeiLi, YinWang,JiliangMu, KunAn, XiujianChou,Enhancement of c-Si surface passivation quality by increasingin situH₂flowrate,Mater. Lett. 161(2015)175-177.
论著情况：李伟、顾德恩、龙剑平，太阳能电池材料及其应用，电子科技大学出版社，40万字，2014.01