周海平 副教授

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邮箱: haipzhou@uestc.edu.cn
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个人简介


周海平，四川师范大学物理与电子工程学院讲师（2005-2008年），南洋理工大学博士（2013年），电子科技大学能源科学与工程学院副教授（2013年）。研究方向主要包括低温等离子体源与等离子体诊断，高密度等离子体在材料生长及材料成分、性能调控上的应用，低维材料的生长及其储能器件应用、硅基太阳能电池。作为主研人员参加新加坡经济发展局重点支持太阳能电池项目(NRF2007EWT-CERP01-0208)及第八届中国-新加坡联合研究计划项目“薄膜硅/晶体硅异质结太阳电池关键技术联合研究”（2012-2015），主持国家自然科学基金项目及教育部重点实验室项目各一项，在Adv.Ener.Mater.,Sci.Repors,Appl.Phys.Letts,J.Appl.Phys等SCI学术期刊发表论文40篇，英文专著章节2章,授权专利2项。实验室现有自主建设的电感及电容耦合等离子体源多套，涵盖了低压—大气环境宽压范围辉光放电及材料与器件的固态/液态/气态多物相源制备，实现从调控等离体特征来优化材料处理及材料性能。近年来讲授电能源器件、材料制备与表征、新能源材料基础、工程热力学等本科及研究生课程。
代表性期刊论文：
1. Rapid and Controllable a-Si:H-to-nc-Si:H Transition Induced by a High-density Plasma Route,H.P. Zhou, M. Xu, S. Xu, L.X. Xu, H. Ji, S. Q. Xiao, and Y. Y. Feng,J. Phys. D: Appl. Phys. 50, 385103 (2017).
2. Radicals and ions controlling by adjusting the antenna-substrate distance in a-Si:H deposition using a planar ICP for c-Si surface passivation,H.P. Zhou, S. Xu, M. Xu, L.X. Xu, D.Y. Wei, Y. Xiang and S.Q. Xiao, Applied Surface Science 396, 926 (2016).
3. Hydrogen-plasma-induced Rapid, Low-Temperature Crystallization of μm-thick a-Si:H Films,H. P. Zhou, M. Xu, S. Xu, Liu, C. X. Liu, L. C. Kwek, and L. X. Xu,Scientific Reports, 6, 32716 (2016).
4. Nanocrystalline silicon embedded in silicon suboxide synthesized in high-density inductively coupled plasma,H. P. Zhou, S. Xu, M. Xu, S. Q. Xiao, Y. Xiang,J. Phys. D: Appl. Phys.48, 445302 (2015).
5. Inductively coupled hydrogen plasma processing of AZO thin films for heterojunction solar cell applications,H. P. Zhou,S. Xu, Z. Zhao, Y. Xiang,Journal of Alloy and Compounds610, 107 (2014).
6. Low temperature SiNx:H films deposited by inductively coupled plasma for solar cell applications,H. P. Zhou, D. Y. Wei, L. X. Xu, Y. N. Guo, S. Q. Xiao, S. Y. Huang and S. Xu,Applied Surface Science264, 21 (2013).
7. Si surface passivation by SiOx:H films deposited by low-frequency ICP for solar cell applications,H. P. Zhou, D. Y. Wei, S. Xu, S. Q. Xiao, L. X. Xu, S. Y. Huang, Y. N. Guo, S. Khan, and M. Xu,J. Appl. Phys. D: Applied Phys. 45, 395401 (2012).
8. Phase evolution and room-temperature photoluminescence in amorphous SiC alloy,H. P. Zhou, M. Xu, D. Y. Wei, T. Ong, S. Q. Xiao, L. X. Xu, S. Y. Huang, Y. N. Guo, S. Khan, and S. Xu, J. Appl. Phys.111, 103526 (2012).
9. Crystalline silicon surface passivation by intrinsic silicon thin films deposited by low-frequency inductively coupled plasma,H. P. Zhou, D. Y. Wei, S. Xu, S. Q. Xiao, L. X. Xu, S. Y. Huang, Y. N. Guo, S. Khan, and M. Xu,J. Appl. Phys.112, 013708 (2012).
10. S. Xu, S.Y. Huang, I. Levchenko,H. P. Zhou, D. Y. Wei, S. Q. Xiao, L. X. Xu, W. S. Yan and K. Ostrikov, Highly efficient silicon nanoarray solar cells by a single-step plasma-based process,Advanced Energy Materials1, 373 (2011).
专著章节:
1． S. Q. Xiao, S. Xu andH. P. Zhou, Chapter 12 “Plasma Technology in Silicon Photovoltaics” in Book “Low Temperature Plasma Technology Methods and Applications” (ISBN 00 - CAT# K14746) Taylor & Francis Group, CRC Press, 2013
2． H. P. Zhou, S. Xu and S. Q. Xiao, chapter “High-density plasma enhanced chemical vapor deposition of Si-based materials for solar cell applications” in “Chemical Vapor Deposition-Recent advances and applications in optical, solar cells and solid state devices”, Intech (ISBN 978-953-51-4733-6), 2016






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