Author(s): Zhu, JD (Zhu, Jiandong); Zheng, Z (Zheng, Zhen); Wang, CQ (Wang, Chunqing); Luo, JG (Luo, Jianguo)
Source: JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS DOI: 10.1007/s10854-020-03162-8 Early Access Date: APR 2020
Abstract: The sintering mechanism of multiphase ceramic film-made of alumina, mullite and aluminum nitride-fabricated by water vapor-assisted sintering on Cr/WCu substrate was investigated. The multiphase ceramic film and interfacial reaction layer between ceramic film and Cr/WCu substrate were examined to reveal their microstructure by relevant test methods. The multiphase ceramic was composed of alpha-Al2O3 and mullite-coated aluminum nitride particles. During metastable stage, metastable alumina and amorphous silica were generated, which originated from AlN and PCS, respectively. A structure containing Al-Si-O glass and metastable alumina-coated AlN particle was formed. With firing temperature increasing to 1050 degrees C, Al-Si-O glass crystallized and generated crystal mullite. Meanwhile, alpha-Al2O3 was formed from metastable alumina. kappa-Al2O3 and Al1.98Cr0.02O3 phases were observed in the interfacial reaction layer by high-resolution transmission electron microscopy. It revealed that the distances of (002) facet for kappa-Al2O3 and (104) facet for Al1.98Cr0.02O3 were 0.447 nm and 0.255 nm, respectively. During water vapor-assisted sintering, kappa-Al2O3 and Cr2O3 were generated, which were derived from AlN and Cr, respectively. When the sintering temperature was increased to 1050 degrees C, kappa-Al2O3 and Cr2O3 would react with each other and generate Al1.98Cr0.02O3 phase. The Al1.98Cr0.02O3 phase was of great help to improving adhesion strength of multiphase ceramic film on Cr/WCu substrate.
Accession Number: WOS:000522925900005
ISSN: 0957-4522
eISSN: 1573-482X
Full Text: https://link.springer.com/article/10.1007%2Fs10854-020-03162-8