洪义麟
单位：国家同步辐射实验室
地址：安徽省合肥市黄山路443号
邮编：230027
电话：86-
个人主页：
实验室介绍：


个人简历 Personal resume


1985年加入国家同步辐射衍射光学元件组，长期从事同步辐射软X射线波带片、光栅的研制，从事X射线透射光栅、全息离子束光栅研制，承担和组织多项863大口径光栅项目，先后研制了大型离子束刻蚀机、旋涂机、弯月面涂胶机、灰化机等系列微细加工设备，目前担任惯约重大专项子项衍射光学元件攻关负责人。 持续专注光栅在光谱仪器、高性能激光加工、VR等领域的应用研究。


研究方向 Research direction


1、同步辐射光学/光栅
2、强激光应用/大口径高阈值衍射元件
3、微细加工/设备研发及加工工艺



招生信息 Enrollment information


欢迎具有光学、光学仪器、信息和自动化、精密机械、真空等相关专业学生报考，实验室工艺设备和测试仪器处于国内一流水平，学生待遇从优。


论文专著 The monograph


1)Optimum inductiverly coupled plasma etching of fused silica to remove subsurface damage layer - Applied Surface Science - 2015 -
2)Terrace morphology on fused silica surfaces by Ar+ ion bombardment with Mo co-deposition. - Appl.Phys.Lett. - -
3)High-accuracy alignment of the grating pattern along silicon <1 1 2> directions using a short rectangular array. - Journal of Micromechanics and Microengineering. - -
4)Near-field holography enhanced with antireflection coatings-an improved method for fabricating diffraction gratings - Chinese Opt. Lett. - -
5)Investigation on morphology and evolution process of plasma induced pitting damage during the ICP etching of fused silica - Vacuum - -
6)弯月面涂胶均匀性改进 - 强激光与粒子束 - -
7)Alignment method for fabricating a parallel flat-field grating used in soft x-ray region - Appl.Opt. - -